Inventor
PERLOV ILYA
US47 patents
⚠️ This page may combine multiple inventors who share the name “PERLOV ILYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
46 patentsUS6167834B1Jan 2, 2001
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
APPLIED MATERIALS INC367 citations99
US6146463ANov 14, 2000
Apparatus and method for aligning a substrate on a support member
APPLIED MATERIALS INC412 citations99
US5964653AOct 12, 1999
Carrier head with a flexible membrane for a chemical mechanical polishing system
APPLIED MATERIALS INC194 citations99
US5856240AJan 5, 1999
Chemical vapor deposition of a thin film onto a substrate
APPLIED MATERIALS INC275 citations99
US5804507ASep 8, 1998
Radially oscillating carousel processing system for chemical mechanical polishing
APPLIED MATERIALS INC243 citations99
US5738574AApr 14, 1998
Continuous processing system for chemical mechanical polishing
APPLIED MATERIALS INC797 citations99
US5516367AMay 14, 1996
Chemical vapor deposition chamber with a purge guide
APPLIED MATERIALS INC397 citations99
US5421893AJun 6, 1995
Susceptor drive and wafer displacement mechanism
APPLIED MATERIALS INC732 citations99
US5362526ANov 8, 1994
Plasma-enhanced CVD process using TEOS for depositing silicon oxide
APPLIED MATERIALS INC484 citations99
US5354715AOct 11, 1994
Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
APPLIED MATERIALS INC132 citations99
US5000113AMar 19, 1991
Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process
APPLIED MATERIALS INC1,100 citations99
US4892753AJan 9, 1990
Process for PECVD of silicon oxide using TEOS decomposition
APPLIED MATERIALS INC503 citations99
US4872947AOct 10, 1989
CVD of silicon oxide using TEOS decomposition and in-situ planarization process
APPLIED MATERIALS INC522 citations99
US5951770ASep 14, 1999
Carousel wafer transfer system
APPLIED MATERIALS INC138 citations98
US6283692B1Sep 4, 2001
Apparatus for storing and moving a cassette
APPLIED MATERIALS INC474 citations97
US6082951AJul 4, 2000
Wafer cassette load station
APPLIED MATERIALS INC104 citations97
US5695568ADec 9, 1997
Chemical vapor deposition chamber
APPLIED MATERIALS INC95 citations97
US7614939B2Nov 10, 2009
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
APPLIED MATERIALS INC39 citations96
US6896584B2May 24, 2005
Method of controlling carrier head with multiple chambers
APPLIED MATERIALS INC29 citations96
US6468353B1Oct 22, 2002
Method and apparatus for improved substrate handling
APPLIED MATERIALS INC78 citations96
US6287386B1Sep 11, 2001
Carousel wafer transfer system
APPLIED MATERIALS INC77 citations96
US6126517AOct 3, 2000
System for chemical mechanical polishing having multiple polishing stations
APPLIED MATERIALS INC63 citations96
US6086457AJul 11, 2000
Washing transfer station in a system for chemical mechanical polishing
APPLIED MATERIALS INC71 citations96
US6080046AJun 27, 2000
Underwater wafer storage and wafer picking for chemical mechanical polishing
APPLIED MATERIALS INC49 citations96
USRE36623EMar 21, 2000
Process for PECVD of silicon oxide using TEOS decomposition
APPLIED MATERIALS INC79 citations96
US5882419AMar 16, 1999
Chemical vapor deposition chamber
APPLIED MATERIALS INC46 citations96
US5871811AFeb 16, 1999
Method for protecting against deposition on a selected region of a substrate
APPLIED MATERIALS INC69 citations96
US5755886AMay 26, 1998
Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing
APPLIED MATERIALS INC91 citations96
US6103014AAug 15, 2000
Chemical vapor deposition chamber
APPLIED MATERIALS INC62 citations95
US5935338AAug 10, 1999
Chemical vapor deposition chamber
APPLIED MATERIALS INC63 citations95
US7255632B2Aug 14, 2007
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
APPLIED MATERIALS INC13 citations93
US7097544B1Aug 29, 2006
Chemical mechanical polishing system having multiple polishing stations and providing relative linear polishing motion
APPLIED MATERIALS INC18 citations93
US6648740B2Nov 18, 2003
Carrier head with a flexible membrane to form multiple chambers
APPLIED MATERIALS INC22 citations93
US6506104B2Jan 14, 2003
Carrier head with a flexible membrane
APPLIED MATERIALS INC16 citations93
US6293853B1Sep 25, 2001
Conditioner apparatus for chemical mechanical polishing
APPLIED MATERIALS INC26 citations93
US6277010B1Aug 21, 2001
Carrier head with a flexible membrane for a chemical mechanical polishing system
APPLIED MATERIALS INC18 citations93
US6143127ANov 7, 2000
Carrier head with a retaining ring for a chemical mechanical polishing system
APPLIED MATERIALS INC51 citations93
US6036583AMar 14, 2000
Conditioner head in a substrate polisher and method
APPLIED MATERIALS INC39 citations93
US5931724AAug 3, 1999
Mechanical fastener to hold a polishing pad on a platen in a chemical mechanical polishing system
APPLIED MATERIALS INC40 citations93
US5893795AApr 13, 1999
Apparatus for moving a cassette
APPLIED MATERIALS INC50 citations93
US6374508B1Apr 23, 2002
Apparatus and method for aligning a substrate on a support member
APPLIED MATERIALS INC20 citations92
US7637707B2Dec 29, 2009
Apparatus for storing and moving a cassette
APPLIED MATERIALS INC16 citations91
US6575737B1Jun 10, 2003
Method and apparatus for improved substrate handling
APPLIED MATERIALS INC45 citations91
US6393337B1May 21, 2002
Method and apparatus for orienting substrates
APPLIED MATERIALS INC18 citations90
US7238090B2Jul 3, 2007
Polishing apparatus having a trough
APPLIED MATERIALS INC10 citations84
US6532866B2Mar 18, 2003
Method and apparatus for orienting substrates
APPLIED MATERIALS INC3 citations60