Inventor
OKUBO WAKI
JP3 patents
Patents
3 patentsUS6638684B2Oct 28, 2003
Photosensitive laminate, process for forming resist pattern using same and positive resist composition
TOKYO OHKA KOGYO CO LTD7 citations72
US6921621B2Jul 26, 2005
Positive resist composition of chemical amplification type, resist coated material, method of forming resist pattern, and process for producing semiconductor device
TOKYO OHKA KOGYO CO LTD9 citations71
US7150956B2Dec 19, 2006
Chemical amplification type positive resist composition, resist laminated material, resist pattern forming method and method of manufacturing semiconductor device
TOKYO OHKA KOGYO CO LTD3 citations60