Inventor

NAGAHARA SEIJI

JP35 patents

⚠️ This page may combine multiple inventors who share the name “NAGAHARA SEIJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NAGAHARA SEIJI

TOKYO ELECTRON LTD

Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting

Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes

Metrology for measurement of photosensitizer concentration within photo-sensitized chemically-amplified resist (PS-CAR)

Photo-sensitized chemically amplified resist (PS-CAR) simulation

Substrate treatment system

Method and process for stochastic driven detectivity healing

Exposure apparatus, exposure method and storage medium

Method of simulating resist pattern, resist material and method of optimizing formulation thereof, apparatus and recording medium

Methods for sensitizing photoresist using flood exposures

Methods and techniques to use with photosensitized chemically amplified resist chemicals and processes

Exposure apparatus, resist pattern forming method, and storage medium

Optical processing apparatus, coating/development apparatus, optical processing method, and non-transitory computer-readable storage medium

Optical processing apparatus and substrate processing apparatus

Exposure apparatus, exposure apparatus adjustment method and storage medium

NICHIA CORP

Light source device

Light source device and optical engine

Light source unit and optical engine

Light source unit and optical engine

Light source device, and optical engine in which light source device is used

Light source apparatus and projector having light source apparatus

Light emitting device and substrate

Light source apparatus with lens array

NEC ELECTRONICS CORP

Chemically amplified resist composition, process for manufacturing semiconductor device and patterning process

Chemical amplification type photoresist composition, method for producing a semiconductor device using the composition, and semiconductor substrate

Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition

Semiconductor device and method of manufacturing the same

Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition

Method of forming wiring structure by using photo resist having optimum development rate

Exposure apparatus

UNIV OSAKA

Chemically amplified resist material, pattern-forming method, compound, and production method of compound

Resist-pattern-forming method and chemically amplified resist material

Pattern-forming method

LINTFIELD LTD

Thioxanthone derivatives, composition comprising the same and pattern forming method comprising said composition

Modified thioxanthone photoinitiators

NAGAHARA SEIJI

Pattern verifying method, pattern verifying device, program, and manufacturing method of semiconductor device