Inventor

SOMERVELL MARK

US21 patents

⚠️ This page may combine multiple inventors who share the name “SOMERVELL MARK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SOMERVELL MARK

TOKYO ELECTRON LTD

Dual tone development with plural photo-acid generators in lithographic applications

Systems and methods for developer drain line monitoring

Photo-sensitized chemically amplified resist (PS-CAR) model calibration

Method and process for stochastic driven detectivity healing

UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly

Systems and methods to monitor particulate accumulation for bake chamber cleaning

Methods and systems to monitor, control, and synchronize dispense systems

Systems and methods for spin process video analysis during substrate processing

Systems and methods for monitoring one or more characteristics of a substrate

System and method of planarization control using a cross-linkable material

Predicting across wafer spin-on planarization over a patterned topography

Planarization of semiconductor devices

Hot plate with programmable array of lift devices for multi-bake process optimization

FONSECA CARLOS A

Variable resist protecting groups

Dual tone development processes

Dual tone development with a photo-activated acid enhancement component in lithographic applications

Method for creating gray-scale features for dual tone development processes

Flood exposure process for dual tone development in lithographic applications

TEXAS INSTRUMENTS INC

BARC etch comprising a selective etch chemistry and a high polymerizing gas for CD control

SCHEER STEVEN

Using electric-field directed post-exposure bake for double-patterning (D-P)

GRONHEID ROEL

Method of process optimization for dual tone development