Inventor

KLIPP ANDREAS

DE31 patents

⚠️ This page may combine multiple inventors who share the name “KLIPP ANDREAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KLIPP ANDREAS

BASF SE

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

Defect reduction rinse solution containing ammonium salts of sulfoesters

Use of compositions comprising a surfactant and a hydrophobizer for avoiding anti pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

Use of compositions comprising a siloxane-type additive for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 nm or below

Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

Use of a composition and a process for selectively etching silicon

Photoresist stripping and cleaning composition, method of its preparation and its use

Cleavable additives for use in a method of making a semiconductor substrate

Composition for post chemical-mechanical-polishing cleaning

Use of surfactants having at least three short-chain perfluorinated groups in formulations for photo mask cleaning

Composition for post chemical-mechanical-polishing cleaning

Imidazolidinethione-containing compositions for post-ash residue removal and/or for oxidative etching of a layer or mask comprising TiN

Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process

Composition comprising a siloxane and an alkane for avoiding pattern collapse when treating patterned materials with line-space dimensions of 50 NM or below

Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt

Composition and process for selectively etching a hard mask and/or an etch-stop layer in the presence of layers of low-k materials, copper, cobalt and/or tungsten

Compositions for anti pattern collapse treatment comprising gemini additives

Composition comprising a primary and a secondary surfactant, for cleaning or rinsing a product

Composition for post chemical-mechanical-polishing cleaning

KLIPP ANDREAS

Resist stripping compositions and methods for manufacturing electrical devices

Low-k dielectrics obtainable by twin polymerization

Resist stripping compositions and methods for manufacturing electrical devices

Method for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices having patterned material layers with line-space dimensions of 50 nm and less

Use of surfactants having at least three short-chain perfluorinated groups RF for manufacturing integrated circuits having patterns with line-space dimensions below 50 NM

Aqueous, nitrogen-free cleaning composition and its use for removing residues and contaminants from semiconductor substrates suitable for manufacturing microelectronic devices

MELLIES RAIMUND

Aqueous alkaline cleaning compositions and methods of their use

Aqueous alkaline cleaning compositions and methods of their use

INFINEON TECHNOLOGIES AG

Fabrication method for a semiconductor structure

BRAUN SIMON

Aqueous acidic solution and etching solution and method for texturizing the surface of single crystal and polycrystal silicon substrates

QIMONDA AG

Method of preparing a coating solution and a corresponding use of the coating solution for coating a substrate

CHEN CHIENSHIN

Post ion implant stripper for advanced semiconductor application