Inventor

DHINDSA RAJINDER

US202 patents

⚠️ This page may combine multiple inventors who share the name “DHINDSA RAJINDER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DHINDSA RAJINDER

LAM RES CORP

Gas distribution apparatus for semiconductor processing

Gas distribution apparatus for semiconductor processing

Stepped upper electrode for plasma processing uniformity

Gas distribution apparatus for semiconductor processing

Plasma-enhanced etching in an augmented plasma processing system

Methods and apparatus for substrate processing

Apparatus including showerhead electrode and heater for plasma processing

Gas distribution system having fast gas switching capabilities

Stepped upper electrode for plasma processing uniformity

Showerhead electrode design for semiconductor processing reactor

Solid state temperature controlled substrate holder

Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor

Reaction chamber component having improved temperature uniformity

Focus rings

Clean chemistry low-k organic polymer etch

Control of impedance of RF return path

Plasma processing reactor with multiple capacitive and inductive power sources

Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof

Methods and apparatus for preventing plasma un-confinement events in a plasma processing chamber

Apparatus and methods for adjusting an edge ring potential substrate processing

Control of impedance of RF delivery path

APPLIED MATERIALS INC

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

Creating ion energy distribution functions (IEDF)

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

Adjustable extended electrode for edge uniformity control

Apparatus and method of generating a pulsed waveform

Apparatus and method of forming plasma using a pulsed waveform

Creating ion energy distribution functions (IEDF)

Composite edge ring

Method of controlling ion energy distribution using a pulse generator

Adjustable extended electrode for edge uniformity control

Adjustable extended electrode for edge uniformity control

Pulsed-voltage hardware assembly for use in a plasma processing system

DHINDSA RAJINDER

Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus

Temperature control modules for showerhead electrode assemblies for plasma processing apparatuses

Triode reactor design with multiple radiofrequency powers

Plasma processing chamber with dual axial gas injection and exhaust

Temperature control module using gas pressure to control thermal conductance between liquid coolant and component body

Methods and arrangements for plasma processing system with tunable capacitance

Temperature controlled hot edge ring assembly

Methods and arrangements for controlling plasma processing parameters

Composite showerhead electrode assembly for a plasma processing apparatus

KADKHODAYAN BABAK

Showerhead electrode

Clamped showerhead electrode assembly

FISCHER ANDREAS

Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses

Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses

DE LA LLERA ANTHONY

Showerhead electrode

KELLOGG MICHAEL C

Movable ground ring for a plasma processing chamber