P

Inventor

LUERE OLIVIER

US36 patents
⚠️ This page may combine multiple inventors who share the name “LUERE OLIVIER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

35 patents
US9269590B2Feb 23, 2016

Spacer formation

APPLIED MATERIALS INC195 citations99
US10791617B2Sep 29, 2020

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC62 citations98
US10685807B2Jun 16, 2020

Creating ion energy distribution functions (IEDF)

APPLIED MATERIALS INC38 citations98
US10555412B2Feb 4, 2020

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC67 citations98
US10448494B1Oct 15, 2019

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC68 citations98
US10448495B1Oct 15, 2019

Method of controlling ion energy distribution using a pulse generator with a current-return output stage

APPLIED MATERIALS INC63 citations98
US9947517B1Apr 17, 2018

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC48 citations98
US10923321B2Feb 16, 2021

Apparatus and method of generating a pulsed waveform

APPLIED MATERIALS INC52 citations97
US10916408B2Feb 9, 2021

Apparatus and method of forming plasma using a pulsed waveform

APPLIED MATERIALS INC54 citations97
US10312048B2Jun 4, 2019

Creating ion energy distribution functions (IEDF)

APPLIED MATERIALS INC48 citations97
USD797691SSep 19, 2017

Composite edge ring

APPLIED MATERIALS INC59 citations97
US11284500B2Mar 22, 2022

Method of controlling ion energy distribution using a pulse generator

APPLIED MATERIALS INC21 citations94
US10504702B2Dec 10, 2019

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC14 citations94
US10103010B2Oct 16, 2018

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC34 citations94
US11462389B2Oct 4, 2022

Pulsed-voltage hardware assembly for use in a plasma processing system

APPLIED MATERIALS INC12 citations93
US11848176B2Dec 19, 2023

Plasma processing using pulsed-voltage and radio-frequency power

APPLIED MATERIALS INC5 citations86
US11728124B2Aug 15, 2023

Creating ion energy distribution functions (IEDF)

APPLIED MATERIALS INC5 citations86
US10991556B2Apr 27, 2021

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC11 citations86
US10553404B2Feb 4, 2020

Adjustable extended electrode for edge uniformity control

APPLIED MATERIALS INC13 citations86
US11776789B2Oct 3, 2023

Plasma processing assembly using pulsed-voltage and radio-frequency power

APPLIED MATERIALS INC6 citations85
US11699572B2Jul 11, 2023

Feedback loop for controlling a pulsed voltage waveform

APPLIED MATERIALS INC8 citations85
US11462388B2Oct 4, 2022

Plasma processing assembly using pulsed-voltage and radio-frequency power

APPLIED MATERIALS INC6 citations85
US11393710B2Jul 19, 2022

Wafer edge ring lifting solution

APPLIED MATERIALS INC9 citations85
US11069504B2Jul 20, 2021

Creating ion energy distribution functions (IEDF)

APPLIED MATERIALS INC7 citations84
US12237148B2Feb 25, 2025

Plasma processing assembly using pulsed-voltage and radio-frequency power

APPLIED MATERIALS INC2 citations74
US11508554B2Nov 22, 2022

High voltage filter assembly

APPLIED MATERIALS INC4 citations73
US9520302B2Dec 13, 2016

Methods for controlling Fin recess loading

APPLIED MATERIALS INC3 citations73
US12094752B2Sep 17, 2024

Wafer edge ring lifting solution

APPLIED MATERIALS INC1 citations62
US12057292B2Aug 6, 2024

Feedback loop for controlling a pulsed voltage waveform

APPLIED MATERIALS INC0 citations62
US11482402B2Oct 25, 2022

Methods and apparatus for processing a substrate

APPLIED MATERIALS INC0 citations62
US11521849B2Dec 6, 2022

In-situ deposition process

APPLIED MATERIALS INC0 citations60
US12278110B2Apr 15, 2025

Bias voltage modulation approach for SiO/SiN layer alternating etch process

APPLIED MATERIALS INC0 citations53
US11049760B2Jun 29, 2021

Universal process kit

APPLIED MATERIALS INC0 citations52
US10109464B2Oct 23, 2018

Minimization of ring erosion during plasma processes

APPLIED MATERIALS INC0 citations52
US12456611B2Oct 28, 2025

Systems and methods for controlling a voltage waveform at a substrate during plasma processing

APPLIED MATERIALS INC0 citations51

CHIANG KANG-LIE

1 patent