Inventor

YONEYAMA SHIMAO

JP3 patents

⚠️ This page may combine multiple inventors who share the name “YONEYAMA SHIMAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

NISHIMURA EIICHI

1 patent

US8551289B2Oct 8, 2013

Plasma processing apparatus

NISHIMURA EIICHI46 citations92

HITACHI INT ELECTRIC CO LTD

1 patent

US6858112B2Feb 22, 2005

Process depending on plasma discharges sustained by inductive coupling

HITACHI INT ELECTRIC CO LTD49 citations92

MC ELECTRONICS CO LTD

1 patent

US5965034AOct 12, 1999

High frequency plasma process wherein the plasma is executed by an inductive structure in which the phase and anti-phase portion of the capacitive currents between the inductive structure and the plasma are balanced

MC ELECTRONICS CO LTD115 citations90