Inventor

CHEN HANHONG

US74 patents

⚠️ This page may combine multiple inventors who share the name “CHEN HANHONG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHEN HANHONG

INTERMOLECULAR INC

Enhanced non-noble electrode layers for DRAM capacitor cell

DRAM MIM capacitor using non-noble electrodes

DRAM MIM capacitor using non-noble electrodes

High performance dielectric stack for DRAM capacitor

Asymmetric MIM capacitor for DRAM devices

Titanium-based high-K dielectric films

Titanium based high-K dielectric films

Integration of non-noble DRAM electrode

Inexpensive electrode materials to facilitate rutile phase titanium oxide

High temperature ALD process for metal oxide for DRAM applications

Method for producing MIM capacitors with high K dielectric materials and non-noble electrodes

Semiconductor stacks including catalytic layers

Blocking layers for leakage current reduction in DRAM devices

Blocking layers for leakage current reduction in DRAM devices

Top electrode templating for DRAM capacitor

High performance dielectric stack for DRAM capacitor

Yttrium and titanium high-k dielectric films

Method for fabricating a DRAM capacitor

High performance dielectric stack for DRAM capacitor

Methods to improve electrical performance of ZrO2 based high-K dielectric materials for DRAM applications

APPLIED MATERIALS INC

PEALD nitride films

Plasma source for rotating susceptor

Complementary pattern station designs

Methods for controlling pulse shape in ALD processes

Plasma showerhead with improved uniformity

Dithering or dynamic offsets for improved uniformity

PEALD nitride films

Dithering or dynamic offsets for improved uniformity

Methods for controlling a flow pulse shape

Machine learning based smart process recipe builder to improve azimuthal flow and thickness uniformity

Plasma source for rotating susceptor

Methods to deposit flowable (gap-fill) carbon containing films using various plasma sources

CHEN HANHONG

Method for producing MIM capacitors with high K dielectric materials and non-noble electrodes

Method of processing MIM capacitors to reduce leakage current

Methods for forming high-K crystalline films and related devices

Fabrication of semiconductor stacks with ruthenium-based materials

Enhanced non-noble electrode layers for DRAM capacitor cell

High temperature ALD process of metal oxide for DRAM applications

Band gap improvement in DRAM capacitors

System and method for step coverage measurement

MALHOTRA SANDRA

Adsorption site blocking method for co-doping ALD films

Top electrode templating for DRAM capacitor

High performance dielectric stack for DRAM capacitor

SHANKER SUNIL

Inexpensive electrode materials to facilitate rutile phase titanium oxide

ELPIDA MEMORY INC

Inexpensive electrode materials to facilitate rutile phase titanium oxide

RUI XIANGXIN

Enhanced work function layer supporting growth of rutile phase titanium oxide

HASHIM IMRAN

Yttrium and titanium high-k dielectric films

MALHOTRA SANDRA G

Integration of non-noble DRAM electrode

DEWEERD WIM

Single-sided non-noble metal electrode hybrid MIM stack for DRAM devices

RAMANI KARTHIK

Method for fabricating a DRAM capacitor