Inventor
GRIESSHAMMER RUDOLF
DE16 patents
⚠️ This page may combine multiple inventors who share the name “GRIESSHAMMER RUDOLF”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
WACKER CHEMITRONIC
15 patentsUS4179530ADec 18, 1979
Process for the deposition of pure semiconductor material
WACKER CHEMITRONIC409 citations97
US4156619AMay 29, 1979
Process for cleaning semi-conductor discs
WACKER CHEMITRONIC65 citations96
US4311545AJan 19, 1982
Method for the deposition of pure semiconductor material
WACKER CHEMITRONIC57 citations93
US4454104AJun 12, 1984
Process for working up the residual gases obtained in the deposition of silicon and in the conversion of silicon tetrachloride
WACKER CHEMITRONIC28 citations91
US4173944ANov 13, 1979
Silverplated vapor deposition chamber
WACKER CHEMITRONIC51 citations91
US4131659ADec 26, 1978
Process for producing large-size, self-supporting plates of silicon
WACKER CHEMITRONIC46 citations91
US5049200ASep 17, 1991
Process for the hydrophilizing and/or cement-residue-removing surface treatment of silicon wafers
WACKER CHEMITRONIC38 citations90
US4062714ADec 13, 1977
Process for making hollow silicon bodies and bodies utilizing board-shaped members to form the basic geometric shape so made
WACKER CHEMITRONIC20 citations77
US4525336AJun 25, 1985
Process for removing impurities from silicon fragments
WACKER CHEMITRONIC24 citations76
US4572729AFeb 25, 1986
Method for producing articles of high-purity synthetic quartz glass
WACKER CHEMITRONIC18 citations72
US4515762AMay 7, 1985
Process for processing waste gases resulting during the production of silicon
WACKER CHEMITRONIC15 citations72
US4113532ASep 12, 1978
Process for producing large-size substrate-based semiconductor material utilizing vapor-phase deposition and subsequent resolidification
WACKER CHEMITRONIC18 citations72
US4070797AJan 31, 1978
Nitrogen-free anionic and non-ionic surfactants in a process for producing a haze-free semiconduct
WACKER CHEMITRONIC10 citations72
US4065533ADec 27, 1977
Process for the continuous production of silicon rods or tubes by gaseous deposition into a flexible wound band
WACKER CHEMITRONIC8 citations72
US4160797AJul 10, 1979
Process for the deposition of polycrystalline silicon from the gas phase on heated carriers
WACKER CHEMITRONIC9 citations71