Inventor
HONG SEONG CHUL
KR2 patents
Patents
2 patentsUS10915015B2Feb 9, 2021
EUV mask blank, photomask manufactured by using the EUV mask blank, lithography apparatus using the photomask and method of fabricating semiconductor device using the photomask
SAMSUNG ELECTRONICS CO LTD2 citations68
US7808588B2Oct 5, 2010
Display substrate comprising reflective patterns having a lens shape, method of manufacturing the same, and display apparatus having the same
SAMSUNG ELECTRONICS CO LTD0 citations47