Inventor

LEVINSKI VLADIMIR

IL99 patents

⚠️ This page may combine multiple inventors who share the name “LEVINSKI VLADIMIR”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LEVINSKI VLADIMIR

KLA TENCOR CORP

Approaches in first order scatterometry overlay based on introduction of auxiliary electromagnetic fields

Symmetric target design in scatterometry overlay metrology

Metrology systems and methods

Metrology systems and methods

Target element types for process parameter metrology

Diffraction based overlay scatterometry

Self-moire target design principles for measuring unresolved device-like pitches

Method and system for providing a target design displaying high sensitivity to scanner focus change

Device-like scatterometry overlay targets

Overlay metrology target

Overlay metrology target

Optical gain approach for enhancement of overlay and alignment systems performance

System method and structure for determining focus accuracy

Symmetric target design in scatterometry overlay metrology

Phase characterization of targets

Method and apparatus for increasing metrology or inspection tool throughput

Overlay targets with orthogonal underlayer dummyfill

Estimation of asymmetric aberrations

Systems and methods for metrology with layer-specific illumination spectra

Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination

Self-moiré target design principles for measuring unresolved device-like pitches

Reducing algorithmic inaccuracy in scatterometry overlay metrology

Approach for model calibration used for focus and dose measurement

Metrology targets and methods with oblique periodic structures

Process compatibility improvement by fill factor modulation

Metrology targets with supplementary structures in an intermediate layer

Topographic phase control for overlay measurement

Mitigation of inaccuracies related to grating asymmetries in scatterometry measurements

KLA CORP

Metrology target for scanning metrology

Misregistration metrology by using fringe Moiré and optical Moiré effects

On-the-fly scatterometry overlay metrology target

Scatterometry overlay metrology with orthogonal fine-pitch segmentation

Moiré scatterometry overlay

Imaging overlay with mutually coherent oblique illumination

Imaging overlay targets using moiré elements and rotational symmetry arrangements

KLA TENCOR TECH CORP

Use of overlay diagnostics for enhanced automatic process control

Apparatus and methods for reducing tool-induced shift during overlay metrology

Cross hatched metrology marks and associated method of use

Use of overlay diagnostics for enhanced automatic process control

Target acquisition and overlay metrology based on two diffracted orders imaging

Use of overlay diagnostics for enhanced automatic process control

KANDEL DANIEL

Metrology systems and methods

Multi-layer overlay metrology target and complimentary overlay metrology measurement systems

Angle-resolved antisymmetric scatterometry

LEVINSKI VLADIMIR

Optical system

Enhanced OVL dummy field enabling “on-the-fly” OVL measurement methods

HILL ANDREW V

Discrete polarization scatterometry

KLA TENCOR TECHNOLGIES CORP

Order selected overlay metrology

KLA—TENCOR CORP

Achieving a small pattern placement error in metrology targets

MANASSEN AMNON

Overlay metrology by pupil phase analysis