P

Inventor

NOH YOUNG JIN

KR31 patents
⚠️ This page may combine multiple inventors who share the name “NOH YOUNG JIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

20 patents
US7419918B2Sep 2, 2008

Methods of forming a thin-film structure, methods of manufacturing non-volatile semiconductor devices using the same, and resulting non-volatile semiconductor devices

SAMSUNG ELECTRONICS CO LTD13 citations84
US10283382B2May 7, 2019

Plasma processing apparatus

SAMSUNG ELECTRONICS CO LTD9 citations82
US10720447B2Jul 21, 2020

Integrated circuit memory devices having impurity-doped dielectric regions therein and methods of forming same

SAMSUNG ELECTRONICS CO LTD2 citations72
US10411034B2Sep 10, 2019

Integrated circuit memory devices having impurity-doped dielectric regions therein and methods of forming same

SAMSUNG ELECTRONICS CO LTD2 citations72
US10224185B2Mar 5, 2019

Substrate processing apparatus

SAMSUNG ELECTRONICS CO LTD5 citations70
US8008214B2Aug 30, 2011

Method of forming an insulation structure and method of manufacturing a semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD4 citations63
US8008154B2Aug 30, 2011

Methods of forming impurity containing insulating films and flash memory devices including the same

SAMSUNG ELECTRONICS CO LTD3 citations62
US7893482B2Feb 22, 2011

Semiconductor devices having tunnel and gate insulating layers

SAMSUNG ELECTRONICS CO LTD3 citations62
US7608509B2Oct 27, 2009

Method of manufacturing a flash memory device having compensation members formed on edge portions of a tunnel oxide layer

SAMSUNG ELECTRONICS CO LTD6 citations62
US7585729B2Sep 8, 2009

Method of manufacturing a non-volatile memory device

SAMSUNG ELECTRONICS CO LTD6 citations62
US10355099B2Jul 16, 2019

Semiconductor device

SAMSUNG ELECTRONICS CO LTD1 citations61
US12437969B2Oct 7, 2025

Plasma processing equipment

SAMSUNG ELECTRONICS CO LTD0 citations58
US11501953B2Nov 15, 2022

Plasma processing equipment

SAMSUNG ELECTRONICS CO LTD0 citations58
US7799639B2Sep 21, 2010

Methods of fabricating non-volatile memory devices including a chlorine cured tunnel oxide layer

SAMSUNG ELECTRONICS CO LTD0 citations52
US7537993B2May 26, 2009

Methods of forming semiconductor devices having tunnel and gate insulating layers

SAMSUNG ELECTRONICS CO LTD0 citations52
US9991281B2Jun 5, 2018

Semiconductor devices and methods of manufacturing the same

SAMSUNG ELECTRONICS CO LTD0 citations49
US9754959B2Sep 5, 2017

Non-volatile semiconductor devices

SAMSUNG ELECTRONICS CO LTD1 citations49
US12125685B2Oct 22, 2024

Plasma processing apparatus

SAMSUNG ELECTRONICS CO LTD0 citations46
US10041170B2Aug 7, 2018

Dummy wafer, thin-film forming method, and method of fabricating a semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD0 citations40
US10020234B2Jul 10, 2018

Method of inspecting device using first measurement and second measurement lights

SAMSUNG ELECTRONICS CO LTD0 citations39

LEE DONG YOUL

3 patents

YON GUKHYON

1 patent

NOH YOUNG JIN

1 patent

NOH YOUNG-JIN

1 patent

CHOI EUN-YEOUNG

1 patent

LIM DONG KYOUNG

1 patent

SK HYNIX INC

1 patent

LG INNOTEK CO LTD

1 patent

JEE JUNG-GEUN

1 patent