Inventor
HELLWEG DIRK
DE16 patents
⚠️ This page may combine multiple inventors who share the name “HELLWEG DIRK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
14 patentsUS12353141B2Jul 8, 2025
Method for heating an optical element in a microlithographic projection exposure apparatus and optical system
ZEISS CARL SMT GMBH0 citations60
US11460785B2Oct 4, 2022
Method for the qualification of a mask for microlithography
ZEISS CARL SMT GMBH0 citations60
US11256178B2Feb 22, 2022
Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method
ZEISS CARL SMT GMBH0 citations60
US10761420B2Sep 1, 2020
Microlithographic mask, method for determining edge positions of the images of the structures of such a mask and system for carrying out such a method
ZEISS CARL SMT GMBH1 citations60
US10948637B2Mar 16, 2021
Metrology system having an EUV optical unit
ZEISS CARL SMT GMBH0 citations58
US8659745B2Feb 25, 2014
Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
ZEISS CARL SMT GMBH1 citations52
US9915871B2Mar 13, 2018
Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
ZEISS CARL SMT GMBH0 citations51
US9785052B2Oct 10, 2017
Optical system of a microlithographic projection exposure apparatus and method of reducing image placement errors
ZEISS CARL SMT GMBH0 citations51
US9081294B2Jul 14, 2015
Method for measuring an angularly resolved intensity distribution and projection exposure apparatus
ZEISS CARL SMT GMBH1 citations51
US11061331B2Jul 13, 2021
Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidth
ZEISS CARL SMT GMBH0 citations48
US10564551B2Feb 18, 2020
Method for determining a focus position of a lithography mask and metrology system for carrying out such a method
ZEISS CARL SMT GMBH0 citations48
US12422743B2Sep 23, 2025
Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the method
ZEISS CARL SMT GMBH0 citations47
US10775691B2Sep 15, 2020
Method for examining photolithographic masks and mask metrology apparatus for performing the method
ZEISS CARL SMT GMBH0 citations39
US10481505B2Nov 19, 2019
Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masks
ZEISS CARL SMT GMBH0 citations37