Inventor

JANSSEN MAURICE HENRICUS FRANCISCUS

NL2 patents

Patents

2 patents

US7443486B2Oct 28, 2008

Method for predicting a critical dimension of a feature imaged by a lithographic apparatus

ASML NETHERLANDS BV13 citations81

US11796921B2Oct 24, 2023

Method and lithograph apparatus for measuring a radiation beam

ASML NETHERLANDS BV0 citations52