P

Inventor

KAKUMARU HAJIME

JP14 patents
⚠️ This page may combine multiple inventors who share the name “KAKUMARU HAJIME”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI CHEMICAL CO LTD

13 patents
US5858616AJan 12, 1999

Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same

HITACHI CHEMICAL CO LTD35 citations95
US4312916AJan 26, 1982

Process for producing adhesive film

HITACHI CHEMICAL CO LTD45 citations92
US4562142ADec 31, 1985

Aqueous alkali developable photosensitive composition and photosensitive laminate

HITACHI CHEMICAL CO LTD23 citations82
US6329111B1Dec 11, 2001

Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same

HITACHI CHEMICAL CO LTD8 citations73
US6077647AJun 20, 2000

Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same

HITACHI CHEMICAL CO LTD6 citations73
US5700629ADec 23, 1997

Developing process

HITACHI CHEMICAL CO LTD10 citations73
US5334484AAug 2, 1994

Photopolymerizable composition and photopolymerizable element

HITACHI CHEMICAL CO LTD11 citations73
US4272607AJun 9, 1981

Photosensitive resin composition

HITACHI CHEMICAL CO LTD12 citations73
US5045433ASep 3, 1991

Substituted acridine derivatives and application thereof

HITACHI CHEMICAL CO LTD8 citations72
US4985564AJan 15, 1991

Acridine compound and photopolymerizable composition using the same

HITACHI CHEMICAL CO LTD6 citations72
US5403698AApr 4, 1995

Negative type photosensitive electrodepositing resin composition

HITACHI CHEMICAL CO LTD13 citations68
US6248501B1Jun 19, 2001

Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same

HITACHI CHEMICAL CO LTD3 citations62
US6416931B2Jul 9, 2002

Photosensitive element for preparing a phosphor pattern

HITACHI CHEMICAL CO LTD1 citations51

ASAHI DENKA KOGYO KK

1 patent