Inventor
STENGL GERHARD
AT38 patents
⚠️ This page may combine multiple inventors who share the name “STENGL GERHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IMS IONEN MIKROFAB SYST
18 patentsUS6858118B2Feb 22, 2005
Apparatus for enhancing the lifetime of stencil masks
IMS IONEN MIKROFAB SYST52 citations92
US6326632B1Dec 4, 2001
Particle-optical imaging system for lithography purposes
IMS IONEN MIKROFAB SYST23 citations92
US5350924ASep 27, 1994
Ion-optical imaging system
IMS IONEN MIKROFAB SYST21 citations92
US4894549AJan 16, 1990
Apparatus for demagnification or full-size ion projection lithography
IMS IONEN MIKROFAB SYST25 citations92
US4780382AOct 25, 1988
Process for making a transmission mask
IMS IONEN MIKROFAB SYST28 citations92
US6909103B2Jun 21, 2005
Ion irradiation of a target at very high and very low kinetic ion energies
IMS IONEN MIKROFAB SYST12 citations84
US4859857AAug 22, 1989
Ion-projection apparatus and method of operating same
IMS IONEN MIKROFAB SYST16 citations74
US4835392AMay 30, 1989
Ion-projection apparatus
IMS IONEN MIKROFAB SYST9 citations74
US4823011AApr 18, 1989
Ion-projection lithographic apparatus with means for aligning the mask image with the substrate
IMS IONEN MIKROFAB SYST16 citations74
US4775797AOct 4, 1988
Method of stabilizing a mask
IMS IONEN MIKROFAB SYST10 citations74
US6194730B1Feb 27, 2001
Electrostatic lens
IMS IONEN MIKROFAB SYST14 citations73
US5874739AFeb 23, 1999
Arrangement for shadow-casting lithography
IMS IONEN MIKROFAB SYST9 citations73
US5436460AJul 25, 1995
Ion-optical imaging system
IMS IONEN MIKROFAB SYST11 citations73
US4924104AMay 8, 1990
Ion beam apparatus and method of modifying substrate
IMS IONEN MIKROFAB SYST10 citations72
US5317161AMay 31, 1994
Ion source
IMS IONEN MIKROFAB SYST13 citations70
US4891547AJan 2, 1990
Particle or radiation beam mask and process for making same
IMS IONEN MIKROFAB SYST3 citations63
US5693950ADec 2, 1997
Projection system for charged particles
IMS IONEN MIKROFAB SYST5 citations62
US6661015B2Dec 9, 2003
Pattern lock system
IMS IONEN MIKROFAB SYST6 citations60
IMS NANOFABRICATION GMBH
5 patentsUS7388217B2Jun 17, 2008
Particle-optical projection system
IMS NANOFABRICATION GMBH1,464 citations98
US6768125B2Jul 27, 2004
Maskless particle-beam system for exposing a pattern on a substrate
IMS NANOFABRICATION GMBH186 citations97
US7214951B2May 8, 2007
Charged-particle multi-beam exposure apparatus
IMS NANOFABRICATION GMBH53 citations92
US7199373B2Apr 3, 2007
Particle-optic electrostatic lens
IMS NANOFABRICATION GMBH27 citations91
US7436120B2Oct 14, 2008
Compensation of magnetic fields
IMS NANOFABRICATION GMBH8 citations73
OESTERR INVESTITIONSKREDIT
3 patentsUS4985634AJan 15, 1991
Ion beam lithography
OESTERR INVESTITIONSKREDIT126 citations97
US4916322AApr 10, 1990
Arrangement for stabilizing an irradiated mask
OESTERR INVESTITIONSKREDIT53 citations95
US4967088AOct 30, 1990
Method and apparatus for image alignment in ion lithography
OESTERR INVESTITIONSKREDIT99 citations92