Inventor

TREFONAS III PETER

US94 patents

⚠️ This page may combine multiple inventors who share the name “TREFONAS III PETER”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TREFONAS III PETER

SHIPLEY CO LLC

Methods utilizing antireflective coating compositions with exposure under 200 nm

Antireflective coating compositions

Antireflective coating compositions

Polymer and photoresist compositions

Photoresist compositions comprising blends of ionic and non-ionic photoacid generators

Polymers and photoresist compositions comprising same

Antireflective coating compositions and exposure methods under 200 nm

Coating compositions for use with an overcoated photoresist

Polymer and photoresist compositions

Aperture fill

Coating compositions for use with an overcoated photoresist

Radiation sensitive composition containing novel dye

Photoresist with photoactive compound mixtures

Aperture fill

Polymers and photoresist compositions comprising same

Photoresist compositions particularly suitable for short wavelength imaging

Negative photoresist composition

Esterification product of aromatic novolak resin with quinone diazide sulfonyl group

Method and system for recycling materials

Antireflective coating compositions

Photoresist compositions comprising blends of ionic and non-ionic photoacid generators

ROHM & HAAS ELECT MAT

Coating compositions for photoresists

Methods, photoresists and substrates for ion-implant lithography

Coating compositions for use with an overcoated photoresist

Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same

Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same

Methods of forming electronic devices including filling porous features with a polymer

Organoaluminum materials for forming aluminum oxide layer from coating composition that contains organic solvent

Self-assembled structures, method of manufacture thereof and articles comprising the same

Self-assembled structures, method of manufacture thereof and articles comprising the same

Hardmask

Photoresist compositions

Photoresist and organic antireflective coating compositions

DOW GLOBAL TECHNOLOGIES LLC

Methods for manufacturing block copolymers and articles manufactured therefrom

Copolymer formulations, methods of manufacture thereof and articles comprising the same

Methods for manufacturing block copolymer compositions and articles manufactured therefrom

Methods for manufacturing block copolymers and articles manufactured therefrom

Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same

Neutral layer polymers, methods of manufacture thereof and articles comprising the same

SHIPLEY CO

Point-of-use purification

Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol

Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate

Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol

Positive dye photoresist compositions with 4,6-bis(azophenyl)resorcinol

MICRON TECHNOLOGY INC

Methods of forming patterns by using a brush layer and masks

Methods of forming patterns with a mask formed utilizing a brush layer

CHO SANGHO

Self-assembled structures, method of manufacture thereof and articles comprising the same

TEXAS A & M UNIV SYS

Self-assembled structures, method of manufacture thereof and articles comprising the same

ROHM AND HAAS ELECTRONICS MATERIALS LLC

Hardmask surface treatment

UNIV QUEENSLAND

Nanoparticle-polymer resists