Inventor

ZAMPINI ANTHONY

US66 patents

⚠️ This page may combine multiple inventors who share the name “ZAMPINI ANTHONY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

ZAMPINI ANTHONY

SHIPLEY CO LLC

Antireflective composition

Antireflective porogens

Antireflective porogens

Phenolic/alicyclic copolymers and photoresists

Solvents and photoresist compositions for short wavelength imaging

Antireflective porogens

Resin purification process

Resin purification process

Photoresist with photoactive compound mixtures

Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound

Photoresist compositions for short wavelength imaging

Controlled alternating and block copolymer resins

Purification process of novolar resins using acid treated chelating cation exchange resin

Esterification product of aromatic novolak resin with quinone diazide sulfonyl group

Phenolic resin purification

Photoresist with novel photoactive compound

Method and system for recycling materials

Photoresist composition

Thermodynamically stable photoactive compound

Thermodynamically stable photoactive compound

MONSANTO CO

Tube sheets for permeators

Asymmetric gas separation membranes

Asymmetric gas separation membranes

Asymmetric gas separation membranes

Permeation modified gas separation membranes

Permeation modified membrane

Cross-linked polyphenylene oxide

Cross-linked polyphenylene oxide

Polymeric membranes with ammonium salts

Benzyl substituted phenylene oxide membrane

Amorphous aryl substituted polyarylene oxide membranes

Polyphenylene oxide membrane having chemically bonded coating

Cross-linked polyarylene oxide membranes

Amino ketone cross-linked polyphenylene oxide

Amino ketone cross-linked polyphenylene oxide

SHIPLEY CO

Aromatic novolak resins

Photoresist composition with aromatic novolak binder having a weight-average molecular weight in excess of 1500 Daltons

Aromatic novolak resins and blends

Positive photoresist composition with naphthoquinonediazidesulfonate of oligomeric phenol

Quinone diazide containing photoresist composition utilizing mixed solvent of ethyl lactate, anisole and amyl acetate

Positive dye photoresist compositions with 2,4-bis(phenylazo)resorcinol

Alternating and block copolymer resins

Photoresist composition containing block copolymer resin and positive-working o-quinone diazide or negative-working azide sensitizer compound

Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound

ZAMPINI ANTHONY

Coating compositions for photolithography

Coating compositions for use with an overcoated photoresist

Coating compositions for use with an overcoated photoresist

ROHM & HAAS ELECT MAT

Phenolic/alicyclic copolymers and photoresists

Antireflective hard mask compositions

JAIN VIPUL

Coating compositions for use with an overcoated photoresist