Inventor
TRUSSELL DAVID
US17 patents
⚠️ This page may combine multiple inventors who share the name “TRUSSELL DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
14 patentsUS7861667B2Jan 4, 2011
Multi-part electrode for a semiconductor processing plasma reactor and method of replacing a portion of a multi-part electrode
LAM RES CORP23 citations92
US7430986B2Oct 7, 2008
Plasma confinement ring assemblies having reduced polymer deposition characteristics
LAM RES CORP28 citations92
US5988187ANov 23, 1999
Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports
LAM RES CORP22 citations92
US5911833AJun 15, 1999
Method of in-situ cleaning of a chuck within a plasma chamber
LAM RES CORP49 citations90
US10403476B2Sep 3, 2019
Active showerhead
LAM RES CORP9 citations84
US9502275B1Nov 22, 2016
Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs
LAM RES CORP13 citations82
US10804079B2Oct 13, 2020
Active showerhead
LAM RES CORP3 citations73
US11393705B2Jul 19, 2022
Wafer transport assembly with integrated buffers
LAM RES CORP2 citations71
US10790174B2Sep 29, 2020
Wafer transport assembly with integrated buffers
LAM RES CORP1 citations71
US11764086B2Sep 19, 2023
Wafer transport assembly with integrated buffers
LAM RES CORP0 citations61
USRE38097EApr 29, 2003
Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports
LAM RES CORP1 citations51
US10014196B2Jul 3, 2018
Wafer transport assembly with integrated buffers
LAM RES CORP0 citations50
US9929028B2Mar 27, 2018
Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs
LAM RES CORP1 citations50
US10304707B2May 28, 2019
Load lock interface and integrated post-processing module
LAM RES CORP0 citations41