Inventor
KOEMTZOPOULOS C ROBERT
US11 patents
Patents
11 patentsUS6303044B1Oct 16, 2001
Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers
LAM RES CORP186 citations98
US6017414AJan 25, 2000
Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers
LAM RES CORP186 citations98
US6071573AJun 6, 2000
Process for precoating plasma CVD reactors
LAM RES CORP132 citations97
US6016766AJan 25, 2000
Microwave plasma processor
LAM RES CORP54 citations94
US5988187ANov 23, 1999
Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports
LAM RES CORP22 citations92
US5911833AJun 15, 1999
Method of in-situ cleaning of a chuck within a plasma chamber
LAM RES CORP49 citations90
US7682985B2Mar 23, 2010
Dual doped polysilicon and silicon germanium etch
LAM RES CORP7 citations69
US7951616B2May 31, 2011
Process for wafer temperature verification in etch tools
LAM RES CORP2 citations61
US7425277B1Sep 16, 2008
Method for hard mask CD trim
LAM RES CORP4 citations60
USRE38097EApr 29, 2003
Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports
LAM RES CORP1 citations51
US7667281B2Feb 23, 2010
Method for hard mask CD trim
LAM RES CORP0 citations49