Inventor

KOZAKEVICH FELIX

US42 patents

⚠️ This page may combine multiple inventors who share the name “KOZAKEVICH FELIX”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

KOZAKEVICH FELIX

LAM RES CORP

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers

Method of and apparatus for detecting and controlling in situ cleaning time of vacuum processing chambers

Process for precoating plasma CVD reactors

Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes

Uniformity control circuit for use within an impedance matching circuit

Microwave plasma processor

Plasma processor with electrode responsive to multiple RF frequencies

High aspect ratio etch using modulation of RF powers of various frequencies

Apparatus and method for controlling plasma density profile

Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same

Plasma confinement ring assemblies having reduced polymer deposition characteristics

High aspect ratio etch using modulation of RF powers of various frequencies

Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports

Multiple frequency plasma processor method and apparatus

Method of in-situ cleaning of a chuck within a plasma chamber

Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Multi regime plasma wafer processing to increase directionality of ions

RF ground switch for plasma processing system

Vacuum plasma processor including control in response to DC bias voltage

Impedance matching circuit for operation with a kilohertz RF generator and a megahertz RF generator to control plasma processes

Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same

Electrostatic Chuck design for cooling-gas light-up prevention

Electrostatic chuck with features for preventing electrical arcing and light-up and improving process uniformity

Electrostatic chuck design for cooling-gas light-up prevention

Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

Multi regime plasma wafer processing to increase directionality of ions

Uniformity control circuit for use within an impedance matching circuit

Electrostatic chuck design for cooling-gas light-up prevention

Process control for ion energy delivery using multiple generators and phase control

Tuning voltage setpoint in a pulsed RF signal for a tunable edge sheath system

Radiofrequency signal filter arrangement for plasma processing system

Methods for the optimization of ion energy control in a plasma processing system

Chemical vapor deposition system with a plasma chamber having separate process gas and cleaning gas injection ports

Minimizing reflected power in a tunable edge sheath system

DHINDSA RAJINDER

Plasma confinement rings having reduced polymer deposition characteristics

Apparatus and method for controlling plasma density profile

Plasma confinement rings having reduced polymer deposition characteristics

TAKESHITA KENJI

Selectivity control in a plasma processing system