Inventor
UZAWA SHIGEYUKI
JP30 patents
Patents
30 patentsUS6307620B1Oct 23, 2001
Substrate holding apparatus, substrate transfer system, exposure apparatus, coating apparatus, method for making a device, and method for cleaning a substrate holding section
CANON KK109 citations98
US6333786B1Dec 25, 2001
Aligning method
CANON KK60 citations96
US6081614AJun 27, 2000
Surface position detecting method and scanning exposure method using the same
CANON KK59 citations96
US5751404AMay 12, 1998
Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates
CANON KK54 citations96
US5585925ADec 17, 1996
Alignment method
CANON KK60 citations96
US5543921AAug 6, 1996
Aligning method utilizing reliability weighting coefficients
CANON KK96 citations96
US6493062B2Dec 10, 2002
Driving apparatus and exposure apparatus
CANON KK61 citations95
US6559465B1May 6, 2003
Surface position detecting method having a detection timing determination
CANON KK13 citations93
US5499099AMar 12, 1996
Alignment method and alignment system
CANON KK38 citations93
US6614503B1Sep 2, 2003
Projection exposure apparatus, and device manufacturing method which compensate for a change in optical performance of a projection optical system
CANON KK21 citations92
US6359688B2Mar 19, 2002
Projection exposure apparatus and method of controlling same
CANON KK40 citations92
US6342703B1Jan 29, 2002
Exposure apparatus, exposure method, and device manufacturing method employing the exposure method
CANON KK26 citations92
US6342942B1Jan 29, 2002
Exposure apparatus, exposure control method, and device fabrication method using the exposure apparatus
CANON KK28 citations92
US5986766ANov 16, 1999
Alignment method and alignment system
CANON KK43 citations92
US5920398AJul 6, 1999
Surface position detecting method and scanning exposure method using the same
CANON KK43 citations92
US5793471AAug 11, 1998
Projection exposure method and apparatus in which scanning exposure is performed in accordance with a shot layout of mask patterns
CANON KK35 citations92
US5783341AJul 21, 1998
Alignment for layer formation through determination of target values for translation, rotation and magnification
CANON KK33 citations92
US5695897ADec 9, 1997
Alignment method and semiconductor exposure method
CANON KK48 citations92
US6963075B2Nov 8, 2005
Scanning exposure apparatus and device manufacturing method
CANON KK4 citations74
US6534777B2Mar 18, 2003
Surface position detecting system and method having a sensor selection
CANON KK5 citations74
US6271910B1Aug 7, 2001
Projection exposure apparatus and method
CANON KK7 citations74
US6142660ANov 7, 2000
Semiconductor manufacturing apparatus and command setting method
CANON KK9 citations74
US6097495AAug 1, 2000
Aligning method
CANON KK13 citations73
US7166855B2Jan 23, 2007
Surface position detecting system and method
CANON KK2 citations63
US6864953B2Mar 8, 2005
Exposure apparatus, device manufacturing method, semiconductor manufacturing plant and method of maintaining exposure apparatus
CANON KK5 citations63
US6531706B2Mar 11, 2003
Surface position detecting system and method having an optimum value
CANON KK3 citations63
US7821726B2Oct 26, 2010
Optical element positioning apparatus, projection optical system and exposure apparatus
CANON KK3 citations62
US7525106B2Apr 28, 2009
Exposure apparatus, pressure control method for the same, and device manufacturing method
CANON KK4 citations60
US7948695B2May 24, 2011
Optical element positioning apparatus, projection optical system and exposure apparatus
CANON KK1 citations52
US6473158B2Oct 29, 2002
Exposure method and exposure apparatus
CANON KK1 citations52