Inventor

DONOHOE KEVIN G

US105 patents

⚠️ This page may combine multiple inventors who share the name “DONOHOE KEVIN G”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

DONOHOE KEVIN G

MICRON TECHNOLOGY INC

Gas pulsing for etch profile control

Method and apparatus for reducing isolation stress in integrated circuits

Method and apparatus for controlling the temperature of a gas distribution plate in a process reactor

Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks

Method of forming three-dimensional photonic band structures in solid materials

Reduced power DRAM device and method

Beat frequency modulation for plasma generation

Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks

Plasma reactor

Methods of forming materials over uneven surface topologies, and methods of forming insulative materials over and between conductive lines

Self-aligned PECVD etch mask

Methods for use of pulsed voltage in a plasma reactor

Method of forming a non-conformal layer over and exposing a trench

Self-aligned PECVD etch mask

Method and apparatus for improving etch uniformity in remote source plasma reactors with powered wafer chucks

Plasma reactor

Plasma producing tools, dual-source plasma etchers, dual-source plasma etching methods, and method of forming planar coil dual-source plasma etchers

Plasma etching methods

Dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers

Method for pulsed-plasma enhanced vapor deposition

Method for forming a hole in a semiconductor device

Use of pulsed grounding source in a plasma reactor

Beat frequency modulation for plasma generation

Beat frequency modulation for plasma generation

Methods for use of pulsed voltage in a plasma reactor

Method of forming high aspect ratio apertures

Etchant and method of use

Apparatus for improved low pressure inductively coupled high density plasma reactor

Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities

Plasma reactor

Apparatus and method for improving uniformity in batch processing of semiconductor wafers

Plasma etching methods

Methods of forming materials over uneven surface topologies, and methods of forming insulative materials over and between conductive lines

Method and apparatus for controlling electrostatic coupling to plasmas

Method of forming high aspect ratio apertures

Plasma processing tools, dual-source plasma etchers, dual-source plasma etching methods, and methods of forming planar coil dual-source plasma etchers

Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities

Method and apparatus for reducing isolation stress in integrated circuits

Semiconductor processing methods of forming substrate features, including contact openings

Method and apparatus for controlling electrostatic coupling to plasmas

Selective etch process

Plasma etching method using low ionization potential gas

Plasma etching methods

Plasma etching method using low ionization potential gas

Use of a plasma source to form a layer during the formation of a semiconductor device

Methods of forming openings and methods of controlling the degree of taper of openings

Plasma etching methods

Use of a plasma source to form a layer during the formation of a semiconductor device

Aspect ratio controlled etch selectivity using time modulated DC bias voltage

MICRON SEMICONDUCTOR INC

Use of a high density plasma source having an electrostatic shield for anisotropic polysilicon etching over topography