Inventor
MATSUDA HAJIME
JP41 patents
⚠️ This page may combine multiple inventors who share the name “MATSUDA HAJIME”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KEYENCE CO LTD
11 patentsUS9494528B2Nov 15, 2016
Inspection apparatus, inspection method, and program
KEYENCE CO LTD16 citations92
US10036713B2Jul 31, 2018
Inspection apparatus, inspection method, and program
KEYENCE CO LTD5 citations84
US9778203B2Oct 3, 2017
Inspection apparatus, inspection method, and program
KEYENCE CO LTD7 citations84
US9689806B2Jun 27, 2017
Inspection apparatus, inspection method, and program
KEYENCE CO LTD8 citations84
US10241056B2Mar 26, 2019
Inspection apparatus, inspection method, and program
KEYENCE CO LTD2 citations73
US10156525B2Dec 18, 2018
Inspection apparatus, inspection method, and program
KEYENCE CO LTD2 citations73
US11209712B2Dec 28, 2021
Image processing apparatus
KEYENCE CO LTD0 citations52
US8479991B2Jul 9, 2013
Illumination setting support apparatus of optical information reading apparatus
KEYENCE CO LTD0 citations52
US8342404B2Jan 1, 2013
Illumination setting support apparatus of optical information reading apparatus
KEYENCE CO LTD0 citations52
US9033244B2May 19, 2015
External illumination apparatus for optical information reading apparatus
KEYENCE CO LTD0 citations51
US10627216B2Apr 21, 2020
Image processing apparatus
KEYENCE CO LTD0 citations41
SEDI INC
9 patentsUS10541322B2Jan 21, 2020
Semiconductor device
SEDI INC2 citations73
US9673094B2Jun 6, 2017
Semiconductor device having via hole coated in side surfaces with heat treated nitride metal and method to form the same
SEDI INC2 citations73
US10896970B2Jan 19, 2021
Process of forming high electron mobility transistor (HEMT) and HEMT formed by the same
SEDI INC0 citations63
US10734510B2Aug 4, 2020
Semiconductor device
SEDI INC0 citations52
US10686053B2Jun 16, 2020
Process of forming high electron mobility transistor (HEMT) and HEMT formed by the same
SEDI INC0 citations52
US10546746B2Jan 28, 2020
Process of forming semiconductor epitaxial substrate
SEDI INC0 citations52
US10147605B2Dec 4, 2018
Process of producing epitaxial substrate
SEDI INC0 citations52
US10056252B2Aug 21, 2018
Process of forming nitride semiconductor layers
SEDI INC1 citations52
US10840091B2Nov 17, 2020
Process of forming epitaxial substrate and semiconductor device provided on the same
SEDI INC0 citations42
FUJITSU QUANTUM DEVICES LTD
7 patentsUS6037245AMar 14, 2000
High-speed semiconductor device having a dual-layer gate structure and a fabrication process thereof
FUJITSU QUANTUM DEVICES LTD60 citations96
US6316297B1Nov 13, 2001
Semiconductor device and method for fabricating the same
FUJITSU QUANTUM DEVICES LTD23 citations92
US6078071AJun 20, 2000
High-speed compound semiconductor device having an improved gate structure
FUJITSU QUANTUM DEVICES LTD26 citations92
US6504189B1Jan 7, 2003
Semiconductor device having a microstrip line
FUJITSU QUANTUM DEVICES LTD45 citations89
US6329230B1Dec 11, 2001
High-speed compound semiconductor device having an improved gate structure
FUJITSU QUANTUM DEVICES LTD9 citations74
US6200838B1Mar 13, 2001
Compound semiconductor device and method of manufacturing the same
FUJITSU QUANTUM DEVICES LTD8 citations74
US6476427B2Nov 5, 2002
Microwave monolithic integrated circuit and fabrication process thereof
FUJITSU QUANTUM DEVICES LTD1 citations52
EUDYNA DEVICES INC
3 patentsUS7087957B2Aug 8, 2006
Semiconductor device and manufacturing method of the same
EUDYNA DEVICES INC10 citations74
US7964486B2Jun 21, 2011
Field effect transistor and method for fabricating the same
EUDYNA DEVICES INC2 citations63
US7821031B2Oct 26, 2010
Switch circuit, semiconductor device, and method of manufacturing said semiconductor device
EUDYNA DEVICES INC0 citations42
SHISEIDO CO LTD
3 patentsUS6309653B1Oct 30, 2001
Cholesterol ester clathrate, water-holding composition, hydrous compositions, cosmetics containing the same, and process for the preparation thereof
SHISEIDO CO LTD8 citations72
US5871759AFeb 16, 1999
Cholesterol ester clathrate, water-holding composition, hydrous compositions, cosmetics containing the same, and processes for the preparation thereof
SHISEIDO CO LTD10 citations72
US5447920ASep 5, 1995
Cosmetic composition containing inclusion product with hydroxyalkylated cyclodextrin
SHISEIDO CO LTD10 citations70
MATSUDA HAJIME
3 patentsUS8890917B2Nov 18, 2014
Printing quality evaluation system, laser marking apparatus, printing condition setting device, printing quality evaluation apparatus, printing condition setting program, printing quality evaluation program, and computer-readable recording medium
MATSUDA HAJIME6 citations71
US8714455B2May 6, 2014
External illumination apparatus for optical information reading apparatus
MATSUDA HAJIME2 citations60
US8172143B2May 8, 2012
Code reading device
MATSUDA HAJIME1 citations51