Inventor

MADHAVA AMEETA

US2 patents

Patents

2 patents

US6413321B1Jul 2, 2002

Method and apparatus for reducing particle contamination on wafer backside during CVD process

APPLIED MATERIALS INC679 citations95

US6843881B2Jan 18, 2005

Detecting chemiluminescent radiation in the cleaning of a substrate processing chamber

APPLIED MATERIALS INC17 citations83