Inventor
WONG KWONG HON
US57 patents
⚠️ This page may combine multiple inventors who share the name “WONG KWONG HON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
45 patentsUS6777761B2Aug 17, 2004
Semiconductor chip using both polysilicon and metal gate devices
IBM72 citations98
US6709562B1Mar 23, 2004
Method of making electroplated interconnection structures on integrated circuit chips
IBM90 citations97
US7279413B2Oct 9, 2007
High-temperature stable gate structure with metallic electrode
IBM53 citations96
US6720595B2Apr 13, 2004
Three-dimensional island pixel photo-sensor
IBM59 citations96
US6399490B1Jun 4, 2002
Highly conformal titanium nitride deposition process for high aspect ratio structures
IBM104 citations96
US5516412AMay 14, 1996
Vertical paddle plating cell
IBM394 citations96
US7041525B2May 9, 2006
Three-dimensional island pixel photo-sensor
IBM35 citations93
US6958522B2Oct 25, 2005
Method to fabricate passive components using conductive polymer
IBM27 citations93
US6909145B2Jun 21, 2005
Metal spacer gate for CMOS FET
IBM21 citations93
US6787836B2Sep 7, 2004
Integrated metal-insulator-metal capacitor and metal gate transistor
IBM26 citations93
US7657995B2Feb 9, 2010
Method of fabricating a microelectromechanical system (MEMS) switch
IBM29 citations92
US7348870B2Mar 25, 2008
Structure and method of fabricating a hinge type MEMS switch
IBM21 citations92
US7282802B2Oct 16, 2007
Modified via bottom structure for reliability enhancement
IBM24 citations92
US6444516B1Sep 3, 2002
Semi-insulating diffusion barrier for low-resistivity gate conductors
IBM31 citations92
US6022801AFeb 8, 2000
Method for forming an atomically flat interface for a highly disordered metal-silicon barrier film
IBM23 citations92
US6388327B1May 14, 2002
Capping layer for improved silicide formation in narrow semiconductor structures
IBM31 citations91
US7462527B2Dec 9, 2008
Method of forming nitride films with high compressive stress for improved PFET device performance
IBM14 citations89
US6387790B1May 14, 2002
Conversion of amorphous layer produced during IMP Ti deposition
IBM19 citations89
US7683418B2Mar 23, 2010
High-temperature stable gate structure with metallic electrode
IBM10 citations84
US7105445B2Sep 12, 2006
Interconnect structures with encasing cap and methods of making thereof
IBM11 citations84
US7088074B2Aug 8, 2006
System level device for battery and integrated circuit integration
IBM18 citations84
US6539625B2Apr 1, 2003
Chromium adhesion layer for copper vias in low-k technology
IBM17 citations84
US6383929B1May 7, 2002
Copper vias in low-k technology
IBM17 citations84
US6946716B2Sep 20, 2005
Electroplated interconnection structures on integrated circuit chips
IBM16 citations82
US6967416B2Nov 22, 2005
Shared on-chip decoupling capacitor and heat-sink devices
IBM16 citations81
US6528383B1Mar 4, 2003
Simultaneous formation of deep trench capacitor and resistor
IBM14 citations80
US7041552B2May 9, 2006
Integrated metal-insulator-metal capacitor and metal gate transistor
IBM7 citations74
US7023528B2Apr 4, 2006
Hybrid electronic mask
IBM7 citations74
US6664576B1Dec 16, 2003
Polymer thin-film transistor with contact etch stops
IBM7 citations74
US6620657B2Sep 16, 2003
Method of forming a planar polymer transistor using substrate bonding techniques
IBM12 citations74
US6417567B1Jul 9, 2002
Flat interface for a metal-silicon contract barrier film
IBM8 citations74
US6124639ASep 26, 2000
Flat interface for a metal-silicon contact barrier film
IBM7 citations73
US6661097B1Dec 9, 2003
Ti liner for copper interconnect with low-k dielectric
IBM7 citations72
US7528065B2May 5, 2009
Structure and method for MOSFET gate electrode landing pad
IBM4 citations63
US7193500B2Mar 20, 2007
Thin film resistors of different materials
IBM4 citations63
US6911354B2Jun 28, 2005
Polymer thin-film transistor with contact etch stops
IBM3 citations63
US6864504B2Mar 8, 2005
Planar polymer transistor
IBM4 citations63
US7270884B2Sep 18, 2007
Adhesion layer for Pt on SiO2
IBM2 citations62
US7208414B2Apr 24, 2007
Method for enhanced uni-directional diffusion of metal and subsequent silicide formation
IBM3 citations62
US6509265B1Jan 21, 2003
Process for manufacturing a contact barrier
IBM4 citations62
US7087997B2Aug 8, 2006
Copper to aluminum interlayer interconnect using stud and via liner
IBM4 citations61
US7037824B2May 2, 2006
Copper to aluminum interlayer interconnect using stud and via liner
IBM2 citations61
US7488677B2Feb 10, 2009
Interconnect structures with encasing cap and methods of making thereof
IBM2 citations60
US6857434B2Feb 22, 2005
CMP slurry additive for foreign matter detection
IBM2 citations58
US7906428B2Mar 15, 2011
Modified via bottom structure for reliability enhancement
IBM1 citations52
INFINEON TECHNOLOGIES AG
2 patentsYUAN JUN
1 patentWONG KWONG HON
1 patentCLEVENGER LAWRENCE A
1 patentShowing the top 50 of 57 patents by PatentIndex Score.