Inventor
INAZAWA KOICHIRO
JP20 patents
⚠️ This page may combine multiple inventors who share the name “INAZAWA KOICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
16 patentsUS5595627AJan 21, 1997
Plasma etching method
TOKYO ELECTRON LTD171 citations98
US5770098AJun 23, 1998
Etching process
TOKYO ELECTRON LTD144 citations95
US5772833AJun 30, 1998
Plasma etching apparatus
TOKYO ELECTRON LTD57 citations94
US7625494B2Dec 1, 2009
Plasma etching method and plasma etching unit
TOKYO ELECTRON LTD35 citations92
US5705081AJan 6, 1998
Etching method
TOKYO ELECTRON LTD24 citations92
US6670276B1Dec 30, 2003
Plasma processing method
TOKYO ELECTRON LTD19 citations83
US7125806B2Oct 24, 2006
Etching method
TOKYO ELECTRON LTD8 citations72
US6780342B1Aug 24, 2004
Method of etching and method of plasma treatment
TOKYO ELECTRON LTD7 citations70
US7163887B2Jan 16, 2007
Method for fabricating a semiconductor device
TOKYO ELECTRON LTD5 citations63
US7326650B2Feb 5, 2008
Method of etching dual damascene structure
TOKYO ELECTRON LTD6 citations62
US7119011B2Oct 10, 2006
Semiconductor device and manufacturing method thereof
TOKYO ELECTRON LTD2 citations61
US7344991B2Mar 18, 2008
Method and apparatus for multilayer photoresist dry development
TOKYO ELECTRON LTD6 citations60
US7211197B2May 1, 2007
Etching method and plasma processing method
TOKYO ELECTRON LTD0 citations48
US6986851B2Jan 17, 2006
Dry developing method
TOKYO ELECTRON LTD0 citations47
US8048325B2Nov 1, 2011
Method and apparatus for multilayer photoresist dry development
TOKYO ELECTRON LTD1 citations44
US7582220B1Sep 1, 2009
Etching method
TOKYO ELECTRON LTD0 citations41