Inventor
OGASAWARA MUNEHIRO
JP73 patents
⚠️ This page may combine multiple inventors who share the name “OGASAWARA MUNEHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NUFLARE TECHNOLOGY INC
29 patentsUS8492732B2Jul 23, 2013
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC13 citations84
US11417495B2Aug 16, 2022
Multi-charged particle beam irradiation apparatus and multi-charged particle beam inspection apparatus
NUFLARE TECHNOLOGY INC2 citations73
US10998164B2May 4, 2021
Charged particle beam writing apparatus and charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations73
US10790110B2Sep 29, 2020
Charged particle beam irradiation apparatus, charged particle beam image acquisition apparatus, and charged particle beam inspection apparatus
NUFLARE TECHNOLOGY INC3 citations73
US10629406B2Apr 21, 2020
Optical system adjustment method of image acquisition apparatus
NUFLARE TECHNOLOGY INC3 citations73
US10451976B2Oct 22, 2019
Electron beam irradiation apparatus and electron beam dynamic focus adjustment method
NUFLARE TECHNOLOGY INC2 citations73
US10224172B2Mar 5, 2019
Multi-beam optical system adjustment method, and multi-beam exposure apparatus
NUFLARE TECHNOLOGY INC3 citations73
US10163604B2Dec 25, 2018
Multiple charged particle beam apparatus
NUFLARE TECHNOLOGY INC2 citations73
US10043634B2Aug 7, 2018
Inspection apparatus and inspection method
NUFLARE TECHNOLOGY INC3 citations73
US9916962B2Mar 13, 2018
Multi charged particle beam irradiation apparatus, multi charged particle beam irradiation method, and multi charged particle beam adjustment method
NUFLARE TECHNOLOGY INC2 citations73
US9859096B2Jan 2, 2018
Inspection apparatus and inspection method
NUFLARE TECHNOLOGY INC3 citations73
US9343266B2May 17, 2016
Charged particle beam pattern writing method and charged particle beam writing apparatus that corrects beam rotation utilizing a correlation table
NUFLARE TECHNOLOGY INC3 citations73
US9343268B2May 17, 2016
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC3 citations73
US9299535B2Mar 29, 2016
Multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC4 citations73
US9202673B2Dec 1, 2015
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC4 citations73
US8927941B2Jan 6, 2015
Multi charged particle beam writing apparatus and multi charged particle beam writing method with fixed voltage ratio einzel lens
NUFLARE TECHNOLOGY INC6 citations73
US8729507B2May 20, 2014
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC5 citations73
US11145485B2Oct 12, 2021
Multiple electron beams irradiation apparatus
NUFLARE TECHNOLOGY INC6 citations72
US11139138B2Oct 5, 2021
Multiple electron beams irradiation apparatus
NUFLARE TECHNOLOGY INC5 citations72
US10734190B2Aug 4, 2020
Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation method
NUFLARE TECHNOLOGY INC3 citations72
US10886102B2Jan 5, 2021
Multiple electron beam irradiation apparatus, multiple electron beam irradiation method, and multiple electron beam inspection apparatus
NUFLARE TECHNOLOGY INC2 citations70
US10784073B2Sep 22, 2020
Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line
NUFLARE TECHNOLOGY INC1 citations63
USRE47561EAug 6, 2019
Multi charged particle beam writing method and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC1 citations63
US10283316B2May 7, 2019
Aperture for inspecting multi beam, beam inspection apparatus for multi beam, and multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC1 citations63
US9076564B2Jul 7, 2015
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations63
US8907306B2Dec 9, 2014
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC3 citations63
US8884254B2Nov 11, 2014
Charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC3 citations63
US8835868B2Sep 16, 2014
Multi charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC2 citations63
US8741547B2Jun 3, 2014
Multi charged particle beam writing apparatus and multi charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations63
TOSHIBA KK
19 patentsUS5807650ASep 15, 1998
Photo mask and apparatus for repairing photo mask
TOSHIBA KK57 citations96
US5539211AJul 23, 1996
Charged beam apparatus having cleaning function and method of cleaning charged beam apparatus
TOSHIBA KK56 citations96
US6207117B1Mar 27, 2001
Charged particle beam apparatus and gas supply and exhaustion method employed in the apparatus
TOSHIBA KK20 citations92
US6172364B1Jan 9, 2001
Charged particle beam irradiation apparatus
TOSHIBA KK31 citations92
US5923034AJul 13, 1999
Pattern transfer mask, mask inspection method and a mask inspection apparatus
TOSHIBA KK27 citations92
US6642675B2Nov 4, 2003
Charged particle beam exposing apparatus
TOSHIBA KK13 citations84
US7508526B2Mar 24, 2009
Defect inspecting apparatus
TOSHIBA KK7 citations74
US7122809B2Oct 17, 2006
Charged beam writing method and writing tool
TOSHIBA KK8 citations74
US7002167B2Feb 21, 2006
Charged-particle beam writer
TOSHIBA KK8 citations74
US4794340ADec 27, 1988
Synchrotron-type accelerator with rod-shaped damping antenna
TOSHIBA KK11 citations74
US8362427B2Jan 29, 2013
Electron beam irradiation apparatus and electron beam drawing apparatus
TOSHIBA KK6 citations73
US6606149B1Aug 12, 2003
Optical system adjusting method for energy beam apparatus
TOSHIBA KK11 citations73
US5949076ASep 7, 1999
Charged beam applying apparatus
TOSHIBA KK12 citations73
US5850083ADec 15, 1998
Charged particle beam lithograph apparatus
TOSHIBA KK12 citations73
US6028317AFeb 22, 2000
Charged particle beam optical element charged particle beam exposure apparatus and method of adjusting the same
TOSHIBA KK12 citations72
US5793041AAug 11, 1998
Method for correcting astigmatism and focusing in charged particle optical lens-barrel
TOSHIBA KK8 citations70
US7388216B2Jun 17, 2008
Pattern writing and forming method
TOSHIBA KK2 citations63
US7326943B2Feb 5, 2008
Electron beam irradiating apparatus and irradiating method
TOSHIBA KK2 citations63
US7270921B2Sep 18, 2007
Pattern writing and forming method
TOSHIBA KK2 citations63
YOSHIKAWA RYOICHI
2 patentsShowing the top 50 of 73 patents by PatentIndex Score.