Inventor
FERRASSE STEPHANE
US21 patents
⚠️ This page may combine multiple inventors who share the name “FERRASSE STEPHANE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HONEYWELL INT INC
20 patentsUS6908517B2Jun 21, 2005
Methods of fabricating metallic materials
HONEYWELL INT INC74 citations96
US7017382B2Mar 28, 2006
Methods of forming aluminum-comprising physical vapor deposition targets; sputtered films; and target constructions
HONEYWELL INT INC24 citations91
US6946039B1Sep 20, 2005
Physical vapor deposition targets, and methods of fabricating metallic materials
HONEYWELL INT INC41 citations91
US6878250B1Apr 12, 2005
Sputtering targets formed from cast materials
HONEYWELL INT INC32 citations91
US6723187B2Apr 20, 2004
Methods of fabricating articles and sputtering targets
HONEYWELL INT INC33 citations91
US7767043B2Aug 3, 2010
Copper sputtering targets and methods of forming copper sputtering targets
HONEYWELL INT INC18 citations90
US7618520B2Nov 17, 2009
Physical vapor deposition target constructions
HONEYWELL INT INC13 citations79
US11244815B2Feb 8, 2022
Profiled sputtering target and method of making the same
HONEYWELL INT INC2 citations72
US11421311B2Aug 23, 2022
ECAE materials for high strength aluminum alloys
HONEYWELL INT INC2 citations68
US12217951B2Feb 4, 2025
Profiled sputtering target and method of making the same
HONEYWELL INT INC0 citations62
US12252770B2Mar 18, 2025
ECAE processing for high strength and high hardness aluminum alloys
HONEYWELL INT INC0 citations61
US11649535B2May 16, 2023
ECAE processing for high strength and high hardness aluminum alloys
HONEYWELL INT INC1 citations61
US10900102B2Jan 26, 2021
High strength aluminum alloy backing plate and methods of making
HONEYWELL INT INC1 citations61
US11450516B2Sep 20, 2022
Large-grain tin sputtering target
HONEYWELL INT INC0 citations59
US11359273B2Jun 14, 2022
Frictionless forged aluminum alloy sputtering target with improved properties
HONEYWELL INT INC0 citations57
US11248286B2Feb 15, 2022
ECAE materials for high strength aluminum alloys
HONEYWELL INT INC0 citations56
US11035036B2Jun 15, 2021
Method of forming copper alloy sputtering targets with refined shape and microstructure
HONEYWELL INT INC0 citations56
US7691240B2Apr 6, 2010
Target assemblies, targets, backing plates, and methods of target cooling
HONEYWELL INT INC2 citations53
US10760156B2Sep 1, 2020
Copper manganese sputtering target
HONEYWELL INT INC0 citations49
US10851447B2Dec 1, 2020
ECAE materials for high strength aluminum alloys
HONEYWELL INT INC0 citations48