Inventor
HARRIS RANDY
US26 patents
⚠️ This page may combine multiple inventors who share the name “HARRIS RANDY”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMITOOL INC
12 patentsUS6991710B2Jan 31, 2006
Apparatus for manually and automatically processing microelectronic workpieces
SEMITOOL INC34 citations92
US6752584B2Jun 22, 2004
Transfer devices for handling microelectronic workpieces within an environment of a processing machine and methods of manufacturing and using such devices in the processing of microelectronic workpieces
SEMITOOL INC39 citations92
US6749391B2Jun 15, 2004
Microelectronic workpiece transfer devices and methods of using such devices in the processing of microelectronic workpieces
SEMITOOL INC22 citations92
US6623609B2Sep 23, 2003
Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same
SEMITOOL INC39 citations92
US6439824B1Aug 27, 2002
Automated semiconductor immersion processing system
SEMITOOL INC20 citations92
US6921467B2Jul 26, 2005
Processing tools, components of processing tools, and method of making and using same for electrochemical processing of microelectronic workpieces
SEMITOOL INC37 citations91
US6916412B2Jul 12, 2005
Adaptable electrochemical processing chamber
SEMITOOL INC35 citations91
US6900132B2May 31, 2005
Single workpiece processing system
SEMITOOL INC22 citations88
US6749390B2Jun 15, 2004
Integrated tools with transfer devices for handling microelectronic workpieces
SEMITOOL INC19 citations84
US6878955B2Apr 12, 2005
Method and apparatus for accessing microelectronic workpiece containers
SEMITOOL INC7 citations74
US6717171B2Apr 6, 2004
Method and apparatus for accessing microelectronic workpiece containers
SEMITOOL INC6 citations74
US6575689B2Jun 10, 2003
Automated semiconductor immersion processing system
SEMITOOL INC12 citations73
APPLIED MATERIALS INC
8 patentsUS10203604B2Feb 12, 2019
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC16 citations94
US10474033B2Nov 12, 2019
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC4 citations84
US11112697B2Sep 7, 2021
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC3 citations73
US11899366B2Feb 13, 2024
Method and apparatus for post exposure processing of photoresist wafers
APPLIED MATERIALS INC0 citations62
US9399827B2Jul 26, 2016
Microelectronic substrate electro processing system
APPLIED MATERIALS INC1 citations61
US10373864B2Aug 6, 2019
Systems and methods for wetting substrates
APPLIED MATERIALS INC1 citations55
US10837119B2Nov 17, 2020
Microelectronic substrate electro processing system
APPLIED MATERIALS INC0 citations51
US10087544B2Oct 2, 2018
Microelectronic substrate electro processing system
APPLIED MATERIALS INC0 citations51