Inventor
YUDA KATSUHISA
JP21 patents
⚠️ This page may combine multiple inventors who share the name “YUDA KATSUHISA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NEC CORP
17 patentsUS6851384B2Feb 8, 2005
Remote plasma apparatus for processing substrate with two types of gases
NEC CORP73 citations98
US6663715B1Dec 16, 2003
Plasma CVD apparatus for large area CVD film
NEC CORP255 citations98
US6383299B1May 7, 2002
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film
NEC CORP41 citations96
US5998838ADec 7, 1999
Thin film transistor
NEC CORP77 citations96
US6703267B2Mar 9, 2004
Method of manufacturing thin film transistor
NEC CORP33 citations93
US6444508B1Sep 3, 2002
Method of manufacturing thin film transistor
NEC CORP16 citations93
US6258638B1Jul 10, 2001
Method of manufacturing thin film transistor
NEC CORP32 citations93
US7709063B2May 4, 2010
Remote plasma apparatus for processing substrate with two types of gases
NEC CORP24 citations92
US6830786B2Dec 14, 2004
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film
NEC CORP19 citations92
US6822263B2Nov 23, 2004
Thin film transistor formed on a transparent substrate
NEC CORP24 citations91
US7392759B2Jul 1, 2008
Remote plasma apparatus for processing substrate with two types of gases
NEC CORP9 citations84
US6444327B1Sep 3, 2002
Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film
NEC CORP11 citations74
US6281053B1Aug 28, 2001
Thin film transistor with reduced hydrogen passivation process time
NEC CORP6 citations74
US6118139ASep 12, 2000
Thin film transistor with reduced hydrogen passivation process time
NEC CORP6 citations74
US6779483B2Aug 24, 2004
Plasma CVD apparatus for large area CVD film
NEC CORP9 citations73
US7119363B2Oct 10, 2006
Thin film transistor formed on a transparent substrate
NEC CORP2 citations61
US7585708B2Sep 8, 2009
Method for manufacturing a thin-film transistor
NEC CORP0 citations50