P

Inventor

IZAWA MASARU

JP76 patents
⚠️ This page may combine multiple inventors who share the name “IZAWA MASARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HITACHI HIGH TECH CORP

21 patents
US9038567B2May 26, 2015

Plasma processing apparatus

HITACHI HIGH TECH CORP5 citations84
US7767054B2Aug 3, 2010

Plasma processing apparatus

HITACHI HIGH TECH CORP9 citations84
US11978612B2May 7, 2024

Plasma processing apparatus

HITACHI HIGH TECH CORP3 citations75
US11424105B2Aug 23, 2022

Plasma processing apparatus

HITACHI HIGH TECH CORP3 citations73
US10325781B2Jun 18, 2019

Etching method and etching apparatus

HITACHI HIGH TECH CORP3 citations73
US10217611B2Feb 26, 2019

Plasma processing apparatus and plasma processing method

HITACHI HIGH TECH CORP4 citations73
US7371690B2May 13, 2008

Dry etching method and apparatus

HITACHI HIGH TECH CORP8 citations73
US11217454B2Jan 4, 2022

Plasma processing method and etching apparatus

HITACHI HIGH TECH CORP2 citations72
US10665516B2May 26, 2020

Etching method and plasma processing apparatus

HITACHI HIGH TECH CORP3 citations72
US10090160B2Oct 2, 2018

Dry etching apparatus and method

HITACHI HIGH TECH CORP2 citations67
US12444572B2Oct 14, 2025

Plasma processing apparatus

HITACHI HIGH TECH CORP0 citations62
US11915951B2Feb 27, 2024

Plasma processing method

HITACHI HIGH TECH CORP1 citations62
US11842885B2Dec 12, 2023

Plasma processing apparatus and plasma processing method

HITACHI HIGH TECH CORP0 citations62
US11682542B2Jun 20, 2023

Plasma processing device

HITACHI HIGH TECH CORP0 citations62
US11557463B2Jan 17, 2023

Vacuum processing apparatus

HITACHI HIGH TECH CORP0 citations62
US11515167B2Nov 29, 2022

Plasma etching method and plasma processing apparatus

HITACHI HIGH TECH CORP1 citations62
US10971369B2Apr 6, 2021

Plasma processing method and plasma processing apparatus

HITACHI HIGH TECH CORP0 citations62
US10937635B2Mar 2, 2021

Vacuum processing apparatus

HITACHI HIGH TECH CORP0 citations62
US10930476B2Feb 23, 2021

Plasma processing device

HITACHI HIGH TECH CORP1 citations62
US8349127B2Jan 8, 2013

Vacuum processing apparatus and plasma processing apparatus with temperature control function for wafer stage

HITACHI HIGH TECH CORP2 citations62
US8034181B2Oct 11, 2011

Plasma processing apparatus

HITACHI HIGH TECH CORP2 citations62

HITACHI LTD

18 patents
US6607988B2Aug 19, 2003

Manufacturing method of semiconductor integrated circuit device

HITACHI LTD53 citations96
US7662232B2Feb 16, 2010

Plasma processing apparatus

HITACHI LTD14 citations92
US6842658B2Jan 11, 2005

Method of manufacturing a semiconductor device and manufacturing system

HITACHI LTD40 citations92
US6677244B2Jan 13, 2004

Specimen surface processing method

HITACHI LTD18 citations92
US6573190B1Jun 3, 2003

Dry etching device and dry etching method

HITACHI LTD19 citations92
US6551445B1Apr 22, 2003

Plasma processing system and method for manufacturing a semiconductor device by using the same

HITACHI LTD50 citations92
US6506674B2Jan 14, 2003

Method of manufacturing a semiconductor integrated circuit device

HITACHI LTD37 citations92
US6475918B1Nov 5, 2002

Plasma treatment apparatus and plasma treatment method

HITACHI LTD24 citations92
US7720632B2May 18, 2010

Dimension measuring apparatus and dimension measuring method for semiconductor device

HITACHI LTD8 citations84
US6673685B2Jan 6, 2004

Method of manufacturing semiconductor devices

HITACHI LTD15 citations84
US6645870B2Nov 11, 2003

Process for fabricating semiconductor device

HITACHI LTD16 citations84
US6629538B2Oct 7, 2003

Method for cleaning semiconductor wafers in a vacuum environment

HITACHI LTD14 citations84
US6506687B1Jan 14, 2003

Dry etching device and method of producing semiconductor devices

HITACHI LTD18 citations84
US6784109B2Aug 31, 2004

Method for fabricating semiconductor devices including wiring forming with a porous low-k film and copper

HITACHI LTD9 citations74
US6643893B2Nov 11, 2003

Apparatus for cleaning semiconductor wafers in a vacuum environment

HITACHI LTD10 citations74
US7915055B2Mar 29, 2011

Manufacturing method of semiconductor device

HITACHI LTD5 citations63
US7145146B2Dec 5, 2006

Micro-spectroscopic measuring device and micro-chemical system

HITACHI LTD2 citations63
US6492277B1Dec 10, 2002

Specimen surface processing method and apparatus

HITACHI LTD4 citations63

KOBAYASHI HIROYUKI

4 patents
US8397668B2Mar 19, 2013

Plasma processing apparatus

KOBAYASHI HIROYUKI43 citations98
US8733282B2May 27, 2014

Plasma processing apparatus

KOBAYASHI HIROYUKI6 citations84
US8491751B2Jul 23, 2013

Plasma processing apparatus

KOBAYASHI HIROYUKI5 citations84
US8142567B2Mar 27, 2012

Vacuum processing apparatus

KOBAYASHI HIROYUKI16 citations84

SUMITOMO METAL IND

2 patents
US7666266B2Feb 23, 2010

Surface conditioning prior to chemical conversion treatment of a steel member

SUMITOMO METAL IND86 citations92
US7918945B2Apr 5, 2011

Method for manufacturing surface treated steel material using a chemical conversion treatment liquid

SUMITOMO METAL IND1 citations63

TANDOU TAKUMI

2 patents
US8955579B2Feb 17, 2015

Plasma processing apparatus and plasma processing method

TANDOU TAKUMI8 citations83
US8833089B2Sep 16, 2014

Plasma processing apparatus and maintenance method therefor

TANDOU TAKUMI4 citations72

RENESAS TECH CORP

2 patents
US7723235B2May 25, 2010

Method for smoothing a resist pattern prior to etching a layer using the resist pattern

RENESAS TECH CORP7 citations74
US6977229B2Dec 20, 2005

Manufacturing method for semiconductor devices

RENESAS TECH CORP5 citations63

YOKOGAWA KEN'ETSU

1 patent
US9490104B2Nov 8, 2016

Heat treatment apparatus

YOKOGAWA KEN'ETSU3 citations71

Showing the top 50 of 76 patents by PatentIndex Score.