Inventor

TAKAHASHI HYOU

JP20 patents

⚠️ This page may combine multiple inventors who share the name “TAKAHASHI HYOU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAKAHASHI HYOU

FUJIFILM CORP

Resist composition for electron beam, EUV or X-ray

Resist composition for immersion exposure and pattern formation method using the same

Chemical amplification resist composition and pattern-forming method using the same

Positive resist composition and pattern formation method using the same

Resist composition and method of pattern formation with the same

Positive-working resist composition

CANON KK

Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head

Liquid-ejecting head and method of manufacturing the liquid-ejecting head

Organic residue inspecting method and liquid discharge head producing method

Photosensitive negative resin composition

Liquid ejection head and method of manufacturing the same

FUJI PHOTO FILM CO LTD

Resist composition

Stimulus sensitive compound and stimulus sensitive composition containing the same

Resist composition

Positive resist composition

TAKAHASHI HYOU

Positive photosensitive composition and method of forming pattern using the same

Positive photosensitive composition and method of forming pattern using the same

Photosensitive negative resin composition

TAKEI YASUNORI

Print head and inkjet printing apparatus

KATO TAKAYUKI

Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using same