Inventor

CHOI SEONG-WOON

KR28 patents

⚠️ This page may combine multiple inventors who share the name “CHOI SEONG-WOON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CHOI SEONG-WOON

SAMSUNG ELECTRONICS CO LTD

Method of forming fine patterns using a block copolymer

Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask

Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare

Photomask for off-axis illumination and method of fabricating the same

Photomask and method of controlling transmittance and phase of light using the photomask

Method of manufacturing EUVL alternating phase-shift mask

Photo-mask having exposure blocking region and methods of designing and fabricating the same

Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare

Methods, systems and computer program products for correcting photomask using aerial images and boundary regions

System and method for measuring dimension of patterns formed on photomask

Method of repairing phase shift mask

Photo mask and method of correcting the transmissivity of a photo mask

Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation

Methods for forming pattern using electron beam and cell masks used in electron beam lithography

Method for making an OPC mask and an OPC mask manufactured using the same

Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation

Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method

KIM HYOUNG-HEE

Method of forming fine patterns of a semiconductor device

Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same

JUNG SUNG-GON

Method of forming line/space patterns

KIM SANG-WOOK

Method of manufacturing semiconductor device by using uniform optical proximity correction

KIM KYOUNG TAEK

Method of forming fine patterns using a block copolymer

YOON DONG-KI

Method of forming patterns of semiconductor device

JEONG MOON-GYU

Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect

PARK DONG-WOON

Methods of arranging mask patterns and associated apparatus

KANG YOOL

Photoacid generator, chemically amplified resist composition including the same, and associated methods

JUNG JEE-EUN

Method of fabricating semiconductor device

LEE MI-KYEONG

Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed