Inventor
DENDA ATSUSHI
JP36 patents
⚠️ This page may combine multiple inventors who share the name “DENDA ATSUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEIKO EPSON CORP
29 patentsUS6447691B1Sep 10, 2002
Method for detecting end point of plasma etching, and plasma etching apparatus
SEIKO EPSON CORP40 citations90
US6440260B1Aug 27, 2002
Plasma monitoring method and semiconductor production apparatus
SEIKO EPSON CORP33 citations90
US8916625B2Dec 23, 2014
Ink jet resin ink composition, ink jet recording method, and recorded matter
SEIKO EPSON CORP8 citations83
US7477336B2Jan 13, 2009
Active matrix substrate, method of manufacturing active matrix substrate, electro-optical device, and electronic apparatus
SEIKO EPSON CORP10 citations83
US9637655B2May 2, 2017
Aqueous pigment dispersion and aqueous ink composition containing the same
SEIKO EPSON CORP2 citations73
US9802363B2Oct 31, 2017
Method for producing object
SEIKO EPSON CORP5 citations71
US9873814B2Jan 23, 2018
Ink composition
SEIKO EPSON CORP5 citations70
US9334411B2May 10, 2016
Aqueous pigment dispersion and aqueous ink composition containing the same
SEIKO EPSON CORP2 citations63
US7595137B2Sep 29, 2009
Method of manufacturing color filter substrate, color filter substrate, display device and electronic apparatus
SEIKO EPSON CORP4 citations63
US11370930B2Jun 28, 2022
Solvent-based ink composition
SEIKO EPSON CORP0 citations62
US9512320B2Dec 6, 2016
Base metal pigment, aqueous base metal pigment dispersion liquid, and aqueous ink composition
SEIKO EPSON CORP2 citations62
US9067423B2Jun 30, 2015
Liquid container
SEIKO EPSON CORP2 citations62
US8985754B2Mar 24, 2015
Liquid container and liquid container set
SEIKO EPSON CORP2 citations62
US7808606B2Oct 5, 2010
Method for manufacturing substrate, liquid crystal display apparatus and method for manufacturing the same, and electronic device
SEIKO EPSON CORP2 citations62
US6858446B2Feb 22, 2005
Plasma monitoring method and semiconductor production apparatus
SEIKO EPSON CORP2 citations60
US10392522B2Aug 27, 2019
Ultraviolet curable composition and recorded object
SEIKO EPSON CORP0 citations52
US10106697B2Oct 23, 2018
Aqueous base metal pigment dispersion liquid and aqueous ink composition
SEIKO EPSON CORP0 citations52
US9631102B2Apr 25, 2017
Pigment dispersion liquid and solvent-based ink composition containing the same
SEIKO EPSON CORP0 citations52
US9580607B2Feb 28, 2017
Aqueous base metal pigment dispersion liquid and aqueous ink composition
SEIKO EPSON CORP0 citations52
US9566803B2Feb 14, 2017
Recording method and printer
SEIKO EPSON CORP0 citations52
US9309430B2Apr 12, 2016
Pigment dispersion liquid and solvent-based ink composition containing the same
SEIKO EPSON CORP0 citations52
US7847903B2Dec 7, 2010
Pixel electrode, method for forming the same, electrooptical device, and electronic apparatus
SEIKO EPSON CORP0 citations52
US9375940B2Jun 28, 2016
Ink accommodation body, ink accommodation body set, and bundling body
SEIKO EPSON CORP0 citations51
US9050816B2Jun 9, 2015
Liquid container
SEIKO EPSON CORP1 citations51
US9022544B2May 5, 2015
Ink jet recording method and recorded matter
SEIKO EPSON CORP0 citations51
US9566814B2Feb 14, 2017
Ink jet recording process, ink jet recording apparatus, and recorded matter
SEIKO EPSON CORP0 citations42
US9498973B2Nov 22, 2016
Ink jet recording system
SEIKO EPSON CORP0 citations41
US7432137B2Oct 7, 2008
Method of manufacturing thin film transistor
SEIKO EPSON CORP0 citations41
US9475312B2Oct 25, 2016
Ink jet printer and printing method
SEIKO EPSON CORP0 citations39
DENDA ATSUSHI
4 patentsUS8274142B2Sep 25, 2012
Semiconductor device having stacked multiple substrates and method for producing same
DENDA ATSUSHI4 citations61
US8329494B2Dec 11, 2012
Method for manufacturing solar cell
DENDA ATSUSHI4 citations60
US8960882B2Feb 24, 2015
Ink jet recording method, ink set, and recorded article
DENDA ATSUSHI0 citations51
US9028601B2May 12, 2015
Ink composition and printed matter
DENDA ATSUSHI0 citations49