Inventor
KOTAKE MASAAKI
JP17 patents
Patents
17 patentsUS10120279B2Nov 6, 2018
Negative resist composition and resist pattern forming process
SHINETSU CHEMICAL CO8 citations84
US9720323B2Aug 1, 2017
Chemically amplified positive resist composition and pattern forming process
SHINETSU CHEMICAL CO11 citations84
US11231650B2Jan 25, 2022
Chemically amplified negative resist composition and resist pattern forming process
SHINETSU CHEMICAL CO3 citations73
US10725377B2Jul 28, 2020
Chemically amplified negative resist composition and resist pattern forming process
SHINETSU CHEMICAL CO2 citations73
US9969829B2May 15, 2018
Polymer compound, negative resist composition, laminate, patterning process, and compound
SHINETSU CHEMICAL CO3 citations73
US9740098B2Aug 22, 2017
Chemically amplified negative resist composition using novel onium salt and resist pattern forming process
SHINETSU CHEMICAL CO5 citations73
US11548844B2Jan 10, 2023
Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process
SHINETSU CHEMICAL CO1 citations62
US11429023B2Aug 30, 2022
Onium salt, negative resist composition, and resist pattern forming process
SHINETSU CHEMICAL CO1 citations62
US11124477B2Sep 21, 2021
Sulfonium compound, positive resist composition, and resist pattern forming process
SHINETSU CHEMICAL CO0 citations62
US10416558B2Sep 17, 2019
Positive resist composition, resist pattern forming process, and photomask blank
SHINETSU CHEMICAL CO1 citations62
US12164231B2Dec 10, 2024
Chemically amplified positive resist composition and resist pattern forming process
SHINETSU CHEMICAL CO0 citations52
US12164227B2Dec 10, 2024
Chemically amplified negative resist composition and resist pattern forming process
SHINETSU CHEMICAL CO0 citations52
US11852974B2Dec 26, 2023
Conductive polymer composition, coated product and patterning process
SHINETSU CHEMICAL CO0 citations52
US11131926B2Sep 28, 2021
Resist composition and resist patterning process
SHINETSU CHEMICAL CO0 citations52
US12429772B2Sep 30, 2025
Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compound
SHINETSU CHEMICAL CO0 citations51
US10495969B2Dec 3, 2019
Chemically amplified positive resist composition and resist pattern forming process
SHINETSU CHEMICAL CO0 citations41
US9944738B2Apr 17, 2018
Polymer compound, positive resist composition, laminate, and resist patterning process
SHINETSU CHEMICAL CO0 citations41