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Inventor
FRITCHE JOHN
US
2 patents
Patents
2 patents
US7030031B2
Apr 18, 2006
Method for forming damascene structure utilizing planarizing material coupled with diffusion barrier material
IBM
69 citations
95
US6864180B2
Mar 8, 2005
Method for reworking low-k polymers used in semiconductor structures
IBM
0 citations
49