Inventor
TSAI HSIN-YI
TW32 patents
⚠️ This page may combine multiple inventors who share the name “TSAI HSIN-YI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NAT APPLIED RES LABORATORIES
8 patentsUS10180374B1Jan 15, 2019
Test device and method for testing contact lens and test device for testing hydrous element
NAT APPLIED RES LABORATORIES1 citations62
US10928247B2Feb 23, 2021
System and method for detecting illuminance having a light sensor comprising a light emitting diode receiving a ray of light and generating a sensing voltage
NAT APPLIED RES LABORATORIES0 citations54
US10912948B2Feb 9, 2021
Composite intelligent biological phototherapy device
NAT APPLIED RES LABORATORIES0 citations44
US10912499B2Feb 9, 2021
Detecting apparatus based on image for blood glucose concentration and method thereof
NAT APPLIED RES LABORATORIES0 citations43
US10345236B1Jul 9, 2019
Method for inspecting the water content and oxygen transmissibility of an ophthalmic lens and optical inspecting system for inspecting an ophthalmic lens
NAT APPLIED RES LABORATORIES0 citations42
US9566025B2Feb 14, 2017
Image based oxygen saturation measuring device and method thereof
NAT APPLIED RES LABORATORIES0 citations41
US9269857B2Feb 23, 2016
Method and system for eliminating yellow ring occurring on white light emitting diode
NAT APPLIED RES LABORATORIES0 citations38
US10086559B2Oct 2, 2018
System for online monitoring powder-based 3D printing processes and method thereof
NAT APPLIED RES LABORATORIES0 citations37
TAIWAN SEMICONDUCTOR MFG CO LTD
7 patentsUS10163688B2Dec 25, 2018
Interconnect structure with kinked profile
TAIWAN SEMICONDUCTOR MFG CO LTD6 citations73
US9431221B2Aug 30, 2016
Plasma-processing apparatus with upper electrode plate and method for performing plasma treatment process
TAIWAN SEMICONDUCTOR MFG CO LTD4 citations71
US10049983B2Aug 14, 2018
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9391072B2Jul 12, 2016
Sacrificial oxide with uniform thickness
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9136109B2Sep 15, 2015
Sacrificial oxide with uniform thickness
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US10790124B2Sep 29, 2020
Methods for removing particles from etching chamber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
US9934945B2Apr 3, 2018
Methods for removing particles from etching chamber
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations49
TAIWAN SEMICONDUCTOR MFG
5 patentsUS8008206B2Aug 30, 2011
Double patterning strategy for contact hole and trench in photolithography
TAIWAN SEMICONDUCTOR MFG21 citations92
US9230854B2Jan 5, 2016
Semiconductor device and method
TAIWAN SEMICONDUCTOR MFG4 citations73
US8361684B2Jan 29, 2013
Method for patterning trenches with varying dimension
TAIWAN SEMICONDUCTOR MFG3 citations62
US9355823B2May 31, 2016
Methods for removing particles from etching chamber
TAIWAN SEMICONDUCTOR MFG1 citations59
US7670947B2Mar 2, 2010
Metal interconnect structure and process for forming same
TAIWAN SEMICONDUCTOR MFG1 citations52