Inventor
CHOKSHI HIMANSHU
US5 patents
Patents
5 patentsUS12347650B2Jul 1, 2025
Substrate processing system including dual ion filter for downstream plasma
LAM RES CORP0 citations59
US11967486B2Apr 23, 2024
Substrate processing system including dual ion filter for downstream plasma
LAM RES CORP0 citations59
US12467130B2Nov 11, 2025
Temperature-tuned substrate support for substrate processing systems
LAM RES CORP0 citations56
US12057295B2Aug 6, 2024
RF power compensation to reduce deposition or etch rate changes in response to substrate bulk resistivity variations
LAM RES CORP0 citations53
US11011355B2May 18, 2021
Temperature-tuned substrate support for substrate processing systems
LAM RES CORP1 citations50