Inventor
AMBUROSE GNANAMANI
US7 patents
Patents
7 patentsUS11694911B2Jul 4, 2023
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
LAM RES CORP7 citations83
US12272571B2Apr 8, 2025
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
LAM RES CORP1 citations72
US12272570B2Apr 8, 2025
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
LAM RES CORP1 citations72
US12211709B2Jan 28, 2025
Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead
LAM RES CORP1 citations72
US12542259B2Feb 3, 2026
Plasma-exclusion-zone rings for processing notched wafers
LAM RES CORP0 citations61
US12347650B2Jul 1, 2025
Substrate processing system including dual ion filter for downstream plasma
LAM RES CORP0 citations59
US11967486B2Apr 23, 2024
Substrate processing system including dual ion filter for downstream plasma
LAM RES CORP0 citations59