Inventor
SHIM KYU-HA
US18 patents
⚠️ This page may combine multiple inventors who share the name “SHIM KYU-HA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
9 patentsUS12457731B2Oct 28, 2025
Bottom contact formation for 4F2 vertical DRAM
APPLIED MATERIALS INC0 citations62
US10930508B2Feb 23, 2021
Replacement metal gate formation of PMOS ultra-low voltage devices using a thermal implant
APPLIED MATERIALS INC0 citations62
US12142475B2Nov 12, 2024
Sequential plasma and thermal treatment
APPLIED MATERIALS INC0 citations61
US12444615B2Oct 14, 2025
Forming a doped hardmask
APPLIED MATERIALS INC0 citations57
US11728383B2Aug 15, 2023
Localized stressor formation by ion implantation
APPLIED MATERIALS INC0 citations52
US11664419B2May 30, 2023
Isolation method to enable continuous channel layer
APPLIED MATERIALS INC0 citations51
US11594441B2Feb 28, 2023
Handling for high resistivity substrates
APPLIED MATERIALS INC0 citations51
US11114299B2Sep 7, 2021
Techniques for reducing tip to tip shorting and critical dimension variation during nanoscale patterning
APPLIED MATERIALS INC0 citations51
US12094709B2Sep 17, 2024
Plasma treatment process to densify oxide layers
APPLIED MATERIALS INC0 citations47
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC
5 patentsUS10332748B2Jun 25, 2019
Etch rate modulation through ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations69
US9934982B2Apr 3, 2018
Etch rate modulation through ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC2 citations69
US10204909B2Feb 12, 2019
Non-uniform gate oxide thickness for DRAM device
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations62
US10811257B2Oct 20, 2020
Techniques for forming low stress etch-resistant mask using implantation
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations59
US10354875B1Jul 16, 2019
Techniques for improved removal of sacrificial mask
VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1 citations55