Inventor

RAUF SHAHID

US91 patents

⚠️ This page may combine multiple inventors who share the name “RAUF SHAHID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RAUF SHAHID

APPLIED MATERIALS INC

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Pulsed plasma high aspect ratio dielectric process

Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity

Synchronized radio frequency pulsing for plasma etching

Symmetric VHF source for a plasma reactor

Electrostatic chuck with variable pixelated magnetic field

Ion-ion plasma atomic layer etch process and reactor

Symmetrical inductively coupled plasma source with coaxial RF feed and coaxial shielding

Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding

Symmetric VHF source for a plasma reactor

Apparatus and methods for reducing particles in semiconductor process chambers

Symmetrical inductively coupled plasma source with symmetrical flow chamber

Independent control of RF phases of separate coils of an inductively coupled plasma reactor

Symmetrical inductively coupled plasma source with side RF feeds and RF distribution plates

Plasma reactor with reduced electrical skew using electrical bypass elements

Process for wafer backside polymer removal and wafer front side photoresist removal

Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources

Process for wafer backside polymer removal with a ring of plasma under the wafer

Apparatus and method for front side protection during backside cleaning

Electrostatic chuck for high bias radio frequency (RF) power application in a plasma processing chamber

Symmetric plasma process chamber

Showerhead with interlaced gas feed and removal and methods of use

Plasma reactor with electrode array in ceiling

Ion-ion plasma atomic layer etch process

Symmetric VHF source for a plasma reactor

Symmetrical plural-coil plasma source with side RF feeds and RF distribution plates

Symmetric plasma process chamber

Processing tool with electrically switched electrode assembly

Plasma processing apparatus and liner assembly for tuning electrical skews

FREESCALE SEMICONDUCTOR INC

Method for removing metal foot during high-k dielectric/metal gate etching

Charge-free layer by layer etching of dielectrics

Method of making a contact on a backside of a die

Laterally grown nanotubes and method of formation

Laterally grown nanotubes and method of formation

BERA KALLOL

Plasma reactor gas distribution plate with radially distributed path splitting manifold

Apparatus for controlling the temperature uniformity of a substrate

CHEN ZHIGANG

Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber

RF power delivery system in a semiconductor apparatus

COLLINS KENNETH S

Symmetric VHF plasma power coupler with active uniformity steering

Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes

LIAO BRYAN

Synchronized radio frequency pulsing for plasma etching

BALAKRISHNA AJIT

Gas flow equalizer plate suitable for use in a substrate process chamber

HANAWA HIROJI

In-situ VHF voltage sensor for a plasma reactor

AGARWAL ANKUR

Methods and apparatus for controlling plasma in a process chamber

RAMASWAMY KARTIK

Symmetric VHF source for a plasma reactor

YOUSIF IMAD

Method and apparatus for removing polymer from the wafer backside and edge