Inventor
MERRY WALTER R
US18 patents
⚠️ This page may combine multiple inventors who share the name “MERRY WALTER R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
10 patentsUS7358192B2Apr 15, 2008
Method and apparatus for in-situ film stack processing
APPLIED MATERIALS INC174 citations99
US7968469B2Jun 28, 2011
Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity
APPLIED MATERIALS INC46 citations94
US6355557B2Mar 12, 2002
Oxide plasma etching process with a controlled wineglass shape
APPLIED MATERIALS INC27 citations87
US7967996B2Jun 28, 2011
Process for wafer backside polymer removal and wafer front side photoresist removal
APPLIED MATERIALS INC16 citations84
US7879731B2Feb 1, 2011
Improving plasma process uniformity across a wafer by apportioning power among plural VHF sources
APPLIED MATERIALS INC13 citations84
US7879183B2Feb 1, 2011
Apparatus and method for front side protection during backside cleaning
APPLIED MATERIALS INC13 citations83
US7056830B2Jun 6, 2006
Method for plasma etching a dielectric layer
APPLIED MATERIALS INC14 citations83
US7884025B2Feb 8, 2011
Plasma process uniformity across a wafer by apportioning ground return path impedances among plural VHF sources
APPLIED MATERIALS INC4 citations63
US10854425B2Dec 1, 2020
Feedforward temperature control for plasma processing apparatus
APPLIED MATERIALS INC1 citations61
US9214315B2Dec 15, 2015
Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow
APPLIED MATERIALS INC0 citations50
COLLINS KENNETH S
2 patentsUS8076247B2Dec 13, 2011
Plasma process uniformity across a wafer by controlling RF phase between opposing electrodes
COLLINS KENNETH S11 citations83
US8080479B2Dec 20, 2011
Plasma process uniformity across a wafer by controlling a variable frequency coupled to a harmonic resonator
COLLINS KENNETH S6 citations73