Inventor

RAMASWAMY KARTIK

US257 patents

⚠️ This page may combine multiple inventors who share the name “RAMASWAMY KARTIK”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

RAMASWAMY KARTIK

APPLIED MATERIALS INC

Symmetric plasma process chamber

Chemical vapor deposition plasma reactor having plural ion shower grids

Semiconductor substrate process using an optically writable carbon-containing mask

Process for low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Low temperature CVD process with selected stress of the CVD layer on CMOS devices

Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer

Semiconductor substrate process using a low temperature deposited carbon-containing hard mask

Copper barrier reflow process employing high speed optical annealing

Low temperature plasma deposition process for carbon layer deposition

Chemical vapor deposition plasma process using plural ion shower grids

Chemical vapor deposition plasma process using an ion shower grid

Semiconductor junction formation process including low temperature plasma deposition of an optical absorption layer and high speed optical annealing

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Distributed electrode array for plasma processing

Semiconductor system assemblies and methods of operation

Method of plasma load impedance tuning by modulation of an unmatched low power RF generator

Plasma immersion ion implantation reactor having an ion shower grid

RF measurement feedback control and diagnostics for a plasma immersion ion implantation reactor

Plasma immersion ion implantation process using a capacitively couple plasma source having low dissociation and low minimum plasma voltage

Silicon-on-insulator wafer transfer method using surface activation plasma immersion ion implantation for wafer-to-wafer adhesion enhancement

Plasma immersion ion implantation apparatus including a plasma source having low dissociation and low minimum plasma voltage

Plasma immersion ion implantation process

Plasma immersion ion implantation process using a capacitively coupled plasma source having low dissociation and low minimum plasma voltage

Externally excited torroidal plasma source with magnetic control of ion distribution

Externally excited torroidal plasma source with a gas distribution plate

Method of processing a workpiece using an externally excited torroidal plasma source

Externally excited torroidal plasma source

Fabrication of silicon-on-insulator structure using plasma immersion ion implantation

Porous ceramic liner for a plasma source

Electrostatic chuck with smart lift-pin mechanism for a plasma reactor

Very low temperature CVD process with independently variable conformality, stress and composition of the CVD layer

Externally excited multiple torroidal plasma source

Reactor chamber for an externally excited torroidal plasma source with a gas distribution plate

Externally excited torroidal plasma source using a gas distribution plate

Erosion resistant gas energizer

Substrate support having heat transfer system

Pulsed plasma high aspect ratio dielectric process

Plasma reactor with high speed plasma load impedance tuning by modulation of different unmatched frequency sources

Method of processing a workpiece in a plasma reactor with variable height ground return path to control plasma ion density uniformity

Pulsed-voltage hardware assembly for use in a plasma processing system

Etching methods

Synchronized radio frequency pulsing for plasma etching

Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator

LUBOMIRSKY DMITRY

Gas distribution plate with discrete protective elements

LIAO BRYAN

Synchronized radio frequency pulsing for plasma etching

ZHANG CHUNLEI

Methods and apparatus for tuning matching networks

CHEN ZHIGANG

Efficient and accurate method for real-time prediction of the self-bias voltage of a wafer and feedback control of ESC voltage in plasma processing chamber