Inventor
TATEYAMA MASANORI
JP13 patents
Patents
13 patentsUS5061144AOct 29, 1991
Resist process apparatus
TOKYO ELECTRON LTD183 citations99
US6054181AApr 25, 2000
Method of substrate processing to form a film on multiple target objects
TOKYO ELECTRON LTD106 citations98
US5565034AOct 15, 1996
Apparatus for processing substrates having a film formed on a surface of the substrate
TOKYO ELECTRON LTD216 citations98
US5664254ASep 2, 1997
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD129 citations97
US5725664AMar 10, 1998
Semiconductor wafer processing apparatus including localized humidification between coating and heat treatment sections
TOKYO ELECTRON LTD87 citations95
US6526329B2Feb 25, 2003
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD64 citations93
US6834210B2Dec 21, 2004
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD23 citations92
US6507770B2Jan 14, 2003
Substrate processing system and substrate processing method
TOKYO ELECTRON LTD47 citations92
US6457882B2Oct 1, 2002
Substrate processing method and substrate processing apparatus
TOKYO ELECTRON LTD19 citations92
USRE37470EDec 18, 2001
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD22 citations91
US6394670B2May 28, 2002
Parts maintenance managing system
TOKYO ELECTRON LTD4 citations60
US8372480B2Feb 12, 2013
Coater/developer, method of coating and developing resist film, and computer readable storing medium
TOKYO ELECTRON LTD0 citations52
US8015940B2Sep 13, 2011
Coater/developer, method of coating and developing resist film, and computer readable storing medium
TOKYO ELECTRON LTD0 citations52