Inventor
FANG MINGMING
US20 patents
⚠️ This page may combine multiple inventors who share the name “FANG MINGMING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
10 patentsUS6293848B1Sep 25, 2001
Composition and method for planarizing surfaces
CABOT MICROELECTRONICS CORP86 citations97
US6461227B1Oct 8, 2002
Method of polishing a memory or rigid disk with an ammonia-and/or halide-containing composition
CABOT MICROELECTRONICS CORP52 citations96
US6976905B1Dec 20, 2005
Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
CABOT MICROELECTRONICS CORP34 citations92
US6805812B2Oct 19, 2004
Phosphono compound-containing polishing composition and method of using same
CABOT MICROELECTRONICS CORP18 citations92
US6527817B1Mar 4, 2003
Composition and method for planarizing surfaces
CABOT MICROELECTRONICS CORP25 citations92
US6471884B1Oct 29, 2002
Method for polishing a memory or rigid disk with an amino acid-containing composition
CABOT MICROELECTRONICS CORP22 citations92
US6468137B1Oct 22, 2002
Method for polishing a memory or rigid disk with an oxidized halide-containing polishing system
CABOT MICROELECTRONICS CORP21 citations92
US6793559B2Sep 21, 2004
Composition and method for polishing rigid disks
CABOT MICROELECTRONICS CORP8 citations74
US6347978B1Feb 19, 2002
Composition and method for polishing rigid disks
CABOT MICROELECTRONICS CORP10 citations74
US6716755B2Apr 6, 2004
Composition and method for planarizing surfaces
CABOT MICROELECTRONICS CORP11 citations73
AMCOL INTERNATIONAL CORP
4 patentsUS7112123B2Sep 26, 2006
Chemical-mechanical polishing (CMP) slurry containing clay and CeO2 abrasive particles and method of planarizing surfaces
AMCOL INTERNATIONAL CORP30 citations89
US7087529B2Aug 8, 2006
Chemical-mechanical polishing (CMP) slurry and method of planarizing surfaces
AMCOL INTERNATIONAL CORP11 citations81
US7267784B2Sep 11, 2007
Chemical-mechanical polishing (CMP) slurry and method of planarizing computer memory disk surfaces
AMCOL INTERNATIONAL CORP4 citations59
US7223156B2May 29, 2007
Method chemical-mechanical polishing and planarizing corundum, GaAs, GaP and GaAs/GaP alloy surfaces
AMCOL INTERNATIONAL CORP2 citations59
FUEL TECH INC
4 patentsUS11944952B2Apr 2, 2024
Removing contaminants from water with adsorbents
FUEL TECH INC0 citations62
US11332388B2May 17, 2022
Removal of selenium from water with kaolinite
FUEL TECH INC0 citations62
US8992868B2Mar 31, 2015
Dry processes, apparatus compositions and systems for reducing mercury, sulfur oxides and HCl
FUEL TECH INC2 citations60
US8916120B2Dec 23, 2014
Dry processes, apparatus, compositions and systems for reducing sulfur oxides and HCI
FUEL TECH INC3 citations60