Inventor
SCHEFFERS PAUL IJMERT
NL7 patents
⚠️ This page may combine multiple inventors who share the name “SCHEFFERS PAUL IJMERT”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
MAPPER LITHOGRAPHY IP BV
5 patentsUS9829804B1Nov 28, 2017
Substrate holding device, method for manufacturing such a device, and use of such a device in a lithography system
MAPPER LITHOGRAPHY IP BV4 citations70
US9665014B2May 30, 2017
Charged particle lithography system with alignment sensor and beam measurement sensor
MAPPER LITHOGRAPHY IP BV2 citations70
US9653259B2May 16, 2017
Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
MAPPER LITHOGRAPHY IP BV5 citations68
US9153415B2Oct 6, 2015
Charged particle lithography system with sensor assembly
MAPPER LITHOGRAPHY IP BV0 citations48
US9240306B2Jan 19, 2016
Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
MAPPER LITHOGRAPHY IP BV0 citations41
ASML NETHERLANDS BV
2 patentsUSRE49732ENov 21, 2023
Charged particle lithography system with alignment sensor and beam measurement sensor
ASML NETHERLANDS BV0 citations59
USRE49483EApr 4, 2023
Method for determining a beamlet position and method for determining a distance between two beamlets in a multi-beamlet exposure apparatus
ASML NETHERLANDS BV0 citations58