Inventor

SHI XIAOBO

US57 patents

⚠️ This page may combine multiple inventors who share the name “SHI XIAOBO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SHI XIAOBO

VERSUM MAT US LLC

Metal chemical mechanical planarization (CMP) composition and methods therefore

Low oxide trench dishing chemical mechanical polishing

Additives for barrier chemical mechanical planarization

Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applications

Metal chemical mechanical planarization (CMP) composition and methods therefore

High oxide film removal rate shallow trench (STI) chemical mechanical planarization (CMP) polishing

Low oxide trench dishing chemical mechanical polishing

Low oxide trench dishing chemical mechanical polishing

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with tunable silicon oxide and silicon nitride removal rates

Oxide chemical mechanical planarization (CMP) polishing compositions

Shallow trench isolation (STI) chemical mechanical planarization (CMP) polishing with low abrasive concentration and a combination of chemical additives

Metal compound chemically anchored colloidal particles and methods of production and use thereof

Low oxide trench dishing chemical mechanical polishing

Chemical mechanical planarization composition for polishing oxide materials and method of use thereof

Tungsten chemical mechanical polishing for reduced oxide erosion

Low dishing oxide CMP polishing compositions for shallow trench isolation applications and methods of making thereof

Low oxide trench dishing shallow trench isolation chemical mechanical planarization polishing

Suppressing SiN removal rates and reducing oxide trench dishing for Shallow Trench Isolation (STI) process

Chemical mechanical planarization for tungsten-containing substrates

Composite abrasive particles for chemical mechanical planarization composition and method of use thereof

AIR PROD & CHEM

Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications

Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications

Chemical mechanical polishing composition having chemical additives and methods for using same

Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives

Low dishing copper chemical mechanical planarization

Composite abrasive particles for chemical mechanical planarization composition and method of use thereof

Dishing reducing in tungsten chemical mechanical polishing

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

Method and composition for chemical mechanical planarization of a metal

CMP slurry/method for polishing ruthenium and other films

Metal compound chemically anchored colloidal particles and methods of production and use thereof

Barrier chemical mechanical planarization composition and method thereof

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof

SHI XIAOBO

CMP slurry/method for polishing ruthenium and other films

Chemical mechanical planarization composition and method with low corrosiveness

Method for chemical mechanical planarization of a copper-containing substrate

Method and composition for chemical mechanical planarization of a metal-containing substrate

SPANSION LLC

Memory devices with active and passive layers having multiple self-assembled sublayers

Memory element with nitrogen-containing active layer

Memory device with active layer of dendrimeric material

Memory devices with active and passive doped sol-gel layers

GAUDIANA RUSSELL

Photovoltaic cell with thiazole-containing polymer

Polymers with low band gaps and high charge mobility

Photovoltaic cell with silole-containing polymer

KONARKA TECHNOLOGIES INC

Photovoltaic cell with thiazole-containing polymer

Photovoltaic cell with silole-containing polymer

EMAGIN CORP

Organic light emitting diode devices using thermostable hole-injection and hole-transport compounds

MCCONNELL RACHEL DIANNE

Method for chemical mechanical planarization of a tungsten-containing substrate

MERCK PATENT GMBH

Photovoltaic cell with thiazole-containing polymer