Inventor
SCHLUETER JAMES ALLEN
US14 patents
⚠️ This page may combine multiple inventors who share the name “SCHLUETER JAMES ALLEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
AIR PROD & CHEM
11 patentsUS9305806B2Apr 5, 2016
Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications
AIR PROD & CHEM9 citations81
US8974692B2Mar 10, 2015
Chemical mechanical polishing slurry compositions and method using the same for copper and through-silicon via applications
AIR PROD & CHEM5 citations81
US8999193B2Apr 7, 2015
Chemical mechanical polishing composition having chemical additives and methods for using same
AIR PROD & CHEM10 citations79
US10032644B2Jul 24, 2018
Barrier chemical mechanical planarization slurries using ceria-coated silica abrasives
AIR PROD & CHEM5 citations72
US9978609B2May 22, 2018
Low dishing copper chemical mechanical planarization
AIR PROD & CHEM6 citations72
US9062230B2Jun 23, 2015
Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
AIR PROD & CHEM2 citations59
US9574110B2Feb 21, 2017
Barrier chemical mechanical planarization composition and method thereof
AIR PROD & CHEM1 citations50
US10011741B2Jul 3, 2018
Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
AIR PROD & CHEM0 citations49
US9305476B2Apr 5, 2016
Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
AIR PROD & CHEM0 citations49
US8859428B2Oct 14, 2014
Chemical mechanical polishing (CMP) composition for shallow trench isolation (STI) applications and methods of making thereof
AIR PROD & CHEM0 citations48
US10217645B2Feb 26, 2019
Chemical mechanical polishing (CMP) of cobalt-containing substrate
AIR PROD & CHEM0 citations41